Category:Shan Hu of Albany NY (US)
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Shan Hu of Albany NY (US)
Executive Summary
Shan Hu of Albany NY (US) is an inventor who has filed 6 patents. Their primary areas of innovation include {by chemical means} (4 patents), Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers (3 patents), {by liquid etching only} (2 patents), and they have worked with companies such as Tokyo Electron Limited (6 patents). Their most frequent collaborators include (6 collaborations), (6 collaborations), (6 collaborations).
Patent Filing Activity
Technology Areas
List of Technology Areas
- H01L21/31111 ({by chemical means}): 4 patents
- H01L21/30604 (Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers): 3 patents
- H01L21/32134 ({by liquid etching only}): 2 patents
- H01L21/31055 ({the removal being a chemical etching step, e.g. dry etching (etching per se): 1 patents
- H01L21/7682 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
- H01L21/76819 ({Smoothing of the dielectric (planarisation of insulating materials per se): 1 patents
- H01L21/76831 ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents
Companies
List of Companies
- Tokyo Electron Limited: 6 patents
Collaborators
- Henan Zhang of Albany NY (US) (6 collaborations)
- Sangita Kumari of Albany NY (US) (6 collaborations)
- Peter Delia of Albany NY (US) (6 collaborations)
- Eric Chih-Fang Liu of Albany NY (US) (3 collaborations)
- Robert Clark of Fremont CA (US) (1 collaborations)
Subcategories
This category has the following 5 subcategories, out of 5 total.
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H
P
S
Pages in category "Shan Hu of Albany NY (US)"
The following 3 pages are in this category, out of 3 total.
1
- 17946609. METHODS TO PREVENT SURFACE CHARGE INDUCED CD-DEPENDENT ETCHING OF MATERIAL FORMED WITHIN FEATURES ON A PATTERNED SUBSTRATE simplified abstract (TOKYO ELECTRON LIMITED)
- 18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited)
- 18605526. NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR simplified abstract (Tokyo Electron Limited)