Category:Sebastianus Adrianus GOORDEN

Sebastianus Adrianus GOORDEN

Executive Summary

Sebastianus Adrianus GOORDEN is an inventor who has filed 8 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (5 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (4 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (5 patents), ASML NETHERLANDS B.V. (3 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 5 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 4 patents
• G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/70116 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G02B26/0858 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 2 patents
• G03F9/7019 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G02B21/0016 (Microscopes): 1 patents
• G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
• G02B21/002 (Microscopes): 1 patents
• G02B21/0036 (Microscopes): 1 patents
• G02B21/02 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B21/10 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G03F7/706851 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N21/95623 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• H02N2/108 (ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR): 1 patents
• H02N2/009 (Electric machines in general using piezoelectric effect, electrostriction or magnetostriction (generating mechanical vibrations in general): 1 patents
• H10N30/50 (No explanation available): 1 patents
• H10N30/05 (No explanation available): 1 patents
• G03F7/7015 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/706831 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70516 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70025 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70291 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• B81B7/02 (containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS] (): 1 patents
• B81B2207/11 (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
• B81B2207/015 (MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se): 1 patents
• G03F7/706839 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70725 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7049 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F7/70091 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• ASML Netherlands B.V.: 5 patents
• ASML NETHERLANDS B.V.: 3 patents

Collaborators

• Luc Roger Simonne HASPESLAGH (2 collaborations)
• Ties Wouter VAN DER WOORD (2 collaborations)
• Halil Gökay YEGEN (2 collaborations)
• Guilherme BRONDANI TORRI (2 collaborations)
• Alexander Ludwig KLEIN (2 collaborations)
• Jim Vincent OVERKAMP (2 collaborations)
• Edgar Alberto OSORIO OLIVEROS (2 collaborations)
• Simon Gijsbert Josephus MATHIJSSEN (2 collaborations)
• Kaustuve BHATTACHARYYA (2 collaborations)
• Jin LIAN (2 collaborations)
• Armand Eugene Albert KOOLEN (2 collaborations)
• Simon Reinald HUISMAN (2 collaborations)
• Henricus Petrus Maria PELLEMANS (2 collaborations)
• Nitesh PANDEY of Silicon Valley CA (US) (1 collaborations)
• Leendert Jan KARSSEMEIJER (1 collaborations)
• Manouk RIJPSTRA (1 collaborations)
• Ralph BRINKHOF (1 collaborations)
• Hui Quan LIM (1 collaborations)
• Nitesh PANDEY of Sillcon Valley CA (US) (1 collaborations)
• Alexis HUMBLET (1 collaborations)
• Harm Jan Willem BELT (1 collaborations)
• Filippo ALPEGGIANI (1 collaborations)
• Irwan Dani SETIJA (1 collaborations)
• Timothy Dugan DAVIS of Portland OR (US) (1 collaborations)
• Sera JEON (1 collaborations)
• Shuo-Chun LIN (1 collaborations)
• Sergei SOKOLOV (1 collaborations)
• Muhsin ERALP of Bethel CT (US) (1 collaborations)
• Justin Lloyd KREUZER of Trumbull CT (US) (1 collaborations)