Category:Scott Anderson MIDDLEBROOKS

Scott Anderson MIDDLEBROOKS

Executive Summary

Scott Anderson MIDDLEBROOKS is an inventor who has filed 4 patents. Their primary areas of innovation include IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING (1 patents), 2D [Two Dimensional] image generation (1 patents), IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING (1 patents), and they have worked with companies such as ASML Netherlands B.V. (2 patents), ASML NETHERLANDS B.V. (2 patents). Their most frequent collaborators include (4 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G06V10/24 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06T11/00 (2D [Two Dimensional] image generation): 1 patents
• G06V10/82 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06V10/993 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING): 1 patents
• G06T7/593 (from stereo images): 1 patents
• G06T5/50 (using two or more images, e.g. averaging or subtraction): 1 patents
• G06T7/13 (Edge detection): 1 patents
• G06T2207/10061 (Image acquisition modality): 1 patents
• G06T2207/20084 (Special algorithmic details): 1 patents
• G06T2207/10012 (Image acquisition modality): 1 patents
• G06T2207/20212 (Special algorithmic details): 1 patents
• G06T2207/20081 (Special algorithmic details): 1 patents
• G06T2207/30148 (Subject of image; Context of image processing): 1 patents
• G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70575 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70675 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• ASML Netherlands B.V.: 2 patents
• ASML NETHERLANDS B.V.: 2 patents

Collaborators

• Maxim PISARENCO (4 collaborations)
• Markus Gerardus Martinus Maria VAN KRAAIJ (2 collaborations)
• Chrysostomos BATISTAKIS (2 collaborations)
• Coen Adrianus VERSCHUREN (1 collaborations)
• Tim HOUBEN (1 collaborations)
• Thomas Jarik HUISMAN (1 collaborations)
• Yu CAO of Saratoga CA (US) (1 collaborations)
• Patrick Philipp HELFENSTEIN (1 collaborations)
• Alexander Prasetya KONIJNENBERG (1 collaborations)