Category:Patrick Sebastian UEBEL

Patrick Sebastian UEBEL

Executive Summary

Patrick Sebastian UEBEL is an inventor who has filed 9 patents. Their primary areas of innovation include Non-linear optics (5 patents), OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS (4 patents), Optical fibres with cladding {with or without a coating} (2 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (8 patents), ASML Netherlands B.V. (1 patents). Their most frequent collaborators include (3 collaborations), (3 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G02F1/3528 (Non-linear optics): 5 patents
• G02F1/365 (OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS): 4 patents
• G02B6/02328 (Optical fibres with cladding {with or without a coating}): 2 patents
• G03F9/7034 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F9/7065 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/70616 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• C03B37/15 (MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES): 1 patents
• G02B6/0096 (Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings): 1 patents
• G02B6/02347 (Optical fibres with cladding {with or without a coating}): 1 patents
• G03F7/7085 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• C03B2203/16 (MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES): 1 patents
• C03B2203/42 (MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES): 1 patents
• G02F1/3523 ({Non-linear absorption changing by light, e.g. bleaching}): 1 patents
• G03F7/70041 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70558 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G02B26/0816 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B27/0977 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B6/02366 (Optical fibres with cladding {with or without a coating}): 1 patents
• H01S3/0057 (Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range (semiconductors lasers): 1 patents
• H01S3/06741 (Fibre lasers): 1 patents
• G03F7/70166 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• ASML NETHERLANDS B.V.: 8 patents
• ASML Netherlands B.V.: 1 patents

Collaborators

• Willem Richard PONGERS (3 collaborations)
• Sebastian Thomas BAUERSCHMIDT (3 collaborations)
• Amir ABDOLVAND (2 collaborations)
• Paulus Antonius Andreas TEUNISSEN (2 collaborations)
• Peter Maximilian GÖTZ (2 collaborations)
• Marinus Petrus REIJNDERS (1 collaborations)
• Hendrik SABERT (1 collaborations)
• Peter Maximilian Götz (1 collaborations)
• Sebastian Thomas Bauerschmidt (1 collaborations)
• Coen Hubertus Matheus Baltis (1 collaborations)
• Janneke Ravensbergen (1 collaborations)
• Ali ALSAQQA of Norwalk CT (US) (1 collaborations)
• Aabid PATEL of Stanford CT (US) (1 collaborations)
• Wisham F. KADHIM of Shelton CT (US) (1 collaborations)
• Peter Maximilian GOTZ (1 collaborations)
• Ludovicus VAN DEN OETELAAR (1 collaborations)
• Ralph Jozef Johannes Gerardus Anna Maria SMEETS (1 collaborations)
• Krishnaparvathy PUTHANKOVILAKAM (1 collaborations)
• Ali ALSAQQA of Trumbull CT (US) (1 collaborations)
• Johannes Richard Karl KOHLER (1 collaborations)