Category:Masahiro Fukushima

Masahiro Fukushima

Executive Summary

Masahiro Fukushima is an inventor who has filed 8 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (6 patents), {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors} (5 patents), MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS (4 patents), and they have worked with companies such as Shin-Etsu Chemical Co., Ltd. (8 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 6 patents
• G03F7/0045 ({with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}): 5 patents
• C08F212/24 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 4 patents
• G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 4 patents
• G03F7/0397 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 2 patents
• G03F7/2006 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 2 patents
• C08F220/1806 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 2 patents
• C08F220/1818 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 2 patents
• C07C2601/08 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 2 patents
• C07C2601/14 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 2 patents
• G03F7/029 (Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur): 1 patents
• G03F7/0048 (Photosensitive materials (): 1 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F1/76 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• C07C219/14 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07D295/088 (HETEROCYCLIC COMPOUNDS (macromolecular compounds): 1 patents
• C08F220/1808 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/1809 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/283 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C07C25/18 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C309/12 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C381/12 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07D327/08 (HETEROCYCLIC COMPOUNDS (macromolecular compounds): 1 patents
• C07D333/54 (HETEROCYCLIC COMPOUNDS (macromolecular compounds): 1 patents
• C07D333/76 (HETEROCYCLIC COMPOUNDS (macromolecular compounds): 1 patents
• C07C2603/68 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• C07C2603/86 (ACYCLIC OR CARBOCYCLIC COMPOUNDS): 1 patents
• G03F7/0395 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
• C08F220/1811 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/1812 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/22 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/281 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents
• C08F220/365 (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS): 1 patents

Companies

List of Companies

• Shin-Etsu Chemical Co., Ltd.: 8 patents

Collaborators

• Jun Hatakeyama (3 collaborations)
• Tomomi Watanabe (2 collaborations)
• Keiichi Masunaga (2 collaborations)
• Satoshi Watanabe (2 collaborations)
• Masaaki Kotake (2 collaborations)
• Kenji Funatsu (2 collaborations)
• Yuta Matsuzawa (2 collaborations)
• Masaki Ohashi (1 collaborations)
• Kenji Yamada (1 collaborations)
• Naoki Ishibashi (1 collaborations)