Category:Leendert Jan KARSSEMEIJER

Leendert Jan KARSSEMEIJER

Executive Summary

Leendert Jan KARSSEMEIJER is an inventor who has filed 4 patents. Their primary areas of innovation include {for microlithography (measuring printed patterns for monitoring overlay (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), {for microlithography (measuring printed patterns for monitoring overlay (2 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (2 patents), ASML Netherlands B.V. (2 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 3 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F9/7092 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay): 2 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706831 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70508 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7049 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G01B9/02062 (Interferometers): 1 patents
• G01B11/161 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B11/272 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G03F7/70616 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706841 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7065 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents

Companies

List of Companies

• ASML NETHERLANDS B.V.: 2 patents
• ASML Netherlands B.V.: 2 patents

Collaborators

• Nick Franciscus Wilhelmus THISSEN (2 collaborations)
• Sebastianus Adrianus GOORDEN (1 collaborations)
• Simon Gijsbert Josephus MATHIJSSEN (1 collaborations)
• Manouk RIJPSTRA (1 collaborations)
• Ralph BRINKHOF (1 collaborations)
• Kaustuve BHATTACHARYYA (1 collaborations)
• Patricius Aloysius Jacobus TINNEMANS (1 collaborations)
• Joshua ADAMS of Wilton CT (US) (1 collaborations)
• Leonardo Gabriel MONTILLA of Norwalk CT (US) (1 collaborations)
• Igor Matheus Petronella AARTS of Port Chester NY (US) (1 collaborations)
• Zahrasadat DASTOURI of Norwalk CT (US) (1 collaborations)