Category:Hiroshi HANEKAWA

Hiroshi HANEKAWA

Executive Summary

Hiroshi HANEKAWA is an inventor who has filed 5 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (5 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), Making masks on semiconductor bodies for further photolithographic processing not provided for in group (1 patents), and they have worked with companies such as AGC INC. (3 patents), AGC Inc. (2 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F1/24 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 5 patents
• G03F1/52 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• H01L21/0274 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
• H01L21/0332 (comprising inorganic layers): 1 patents
• H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 1 patents
• G03F1/54 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F1/48 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• AGC INC.: 3 patents
• AGC Inc.: 2 patents

Collaborators

• Toshiyuki UNO (3 collaborations)
• Yusuke ONO (2 collaborations)
• Hirotomo KAWAHARA (1 collaborations)
• Taiga FUDETANI (1 collaborations)
• Shunya TAKI (1 collaborations)
• Hirotomo KAWAHARA of Cuptertino CA (US) (1 collaborations)
• Masafumi AKITA (1 collaborations)
• Hiroyoshi TANABE (1 collaborations)
• Daijiro AKAGI (1 collaborations)
• Takuma KATO (1 collaborations)
• Keishi TSUKIYAMA (1 collaborations)
• Ryusuke OISHI (1 collaborations)
• Sadatatsu IKEDA (1 collaborations)
• Yukihiro IWATA (1 collaborations)
• Chikako HANZAWA (1 collaborations)