Category:Hans Mertens

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Hans Mertens

Executive Summary

Hans Mertens is an inventor who has filed 3 patents. Their primary areas of innovation include {by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating (plating on semiconductors in general (2 patents), Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics} (2 patents), {Geometry or} layout of the interconnection structure {( (2 patents), and they have worked with companies such as IMEC VZW (3 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Hans Mertens Monthly Patent Applications.png

Technology Areas

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List of Technology Areas

  • H01L21/76879 ({by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating (plating on semiconductors in general): 2 patents
  • H01L21/76802 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 2 patents
  • H01L23/5286 ({Geometry or} layout of the interconnection structure {(): 2 patents
  • H01L29/401 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
  • H01L27/0924 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L21/76224 ({using trench refilling with dielectric materials (trench filling with polycristalline silicon): 1 patents
  • H01L21/76805 ({the opening being a via or contact hole penetrating the underlying conductor}): 1 patents
  • H01L23/50 (for integrated circuit devices, {e.g. power bus, number of leads} (): 1 patents
  • H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 1 patents

Companies

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List of Companies

  • IMEC VZW: 3 patents

Collaborators

Subcategories

This category has the following 5 subcategories, out of 5 total.

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