Category:Daria Negri

Daria Negri

Executive Summary

Daria Negri is an inventor who has filed 3 patents. Their primary areas of innovation include MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step (1 patents), and they have worked with companies such as KLA Corporation (3 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G01B11/272 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 2 patents
• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
• G03F7/70683 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N21/4788 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G01B2210/56 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B9/02043 (Interferometers): 1 patents
• H01L21/682 ({Mask-wafer alignment (in general): 1 patents

Companies

List of Companies

• KLA Corporation: 3 patents

Collaborators

• Vladimir Levinski (2 collaborations)
• Itay Gdor (2 collaborations)
• Yuval Lubashevsky (2 collaborations)
• Amnon Manassen (1 collaborations)
• Alon Yagil of Milpitas CA (US) (1 collaborations)
• Nickolai Isakovich of Milpitas CA (US) (1 collaborations)
• Eitan Hajaj (1 collaborations)