Category:Amnon Manassen

Amnon Manassen

Executive Summary

Amnon Manassen is an inventor who has filed 7 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (3 patents), Optical or mechanical part {supplementary adjustable parts} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as KLA Corporation (7 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 3 patents
• G01J1/0407 (Optical or mechanical part {supplementary adjustable parts}): 1 patents
• G03F7/70316 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706841 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706847 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G06F18/40 (Software arrangements specially adapted for pattern recognition, e.g. user interfaces or toolboxes therefor): 1 patents
• G06F3/0481 (based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance): 1 patents
• G06T11/00 (2D [Two Dimensional] image generation): 1 patents
• G06N20/00 (Machine learning): 1 patents
• G06N5/04 (Inference or reasoning models): 1 patents
• G06F18/24 (Classification techniques): 1 patents
• G06F18/214 (Generating training patterns; Bootstrap methods, e.g. bagging or boosting): 1 patents
• G06T2200/24 (IMAGE DATA PROCESSING OR GENERATION, IN GENERAL): 1 patents
• G01N21/9501 ({Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step): 1 patents
• G03F7/70683 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706845 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01B11/272 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B15/00 (Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons (characterised by the use of optical techniques): 1 patents
• G03F7/70655 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01B2210/56 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B11/2441 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B17/06 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01B11/0608 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G01N21/9505 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• G03F9/7084 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• H01J37/3045 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents

Companies

List of Companies

• KLA Corporation: 7 patents

Collaborators

• Avner Safrani (3 collaborations)
• Nadav Gutman (2 collaborations)
• Andrei V. Shchegrov of Campbell CA (US) (2 collaborations)
• Andrew V. Hill of Berkeley CA (US) (1 collaborations)
• Yonatan Vaknin (1 collaborations)
• Nireekshan K. Reddy (1 collaborations)
• Arvind Jayaraman of New Hudson MI (US) (1 collaborations)
• Stilian Ivanov Pandev of Santa Clara CA (US) (1 collaborations)
• Boaz Ophir (1 collaborations)
• Udi Shusterman (1 collaborations)
• Etay Lavert of Milpitas CA (US) (1 collaborations)
• Yossi Simon of Milpitas CA (US) (1 collaborations)
• Dimitry Sanko of Vallejo CA (US) (1 collaborations)
• Vladimir Levinski (1 collaborations)
• Daria Negri (1 collaborations)
• Frank Laske (1 collaborations)
• Yoav Grauer (1 collaborations)
• Shlomo Eisenbach of Milpitas CA (US) (1 collaborations)
• Stephen Hiebert of Milpitas CA (US) (1 collaborations)
• Roel Gronheid (1 collaborations)
• Jonathan Madsen of Los Altos CA (US) (1 collaborations)
• Andrew V. Hill of Sunriver OR (US) (1 collaborations)
• Yossi Simon (1 collaborations)
• Gilad Laredo (1 collaborations)
• Yoram Uziel (1 collaborations)