Canon kabushiki kaisha (20240345501). EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS simplified abstract

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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS

Organization Name

canon kabushiki kaisha

Inventor(s)

YASUTOMO Furuta of Chiba (JP)

EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240345501 titled 'EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS

Simplified Explanation: The exposure apparatus described in the patent application is designed to expose a photosensitive body using light-emitting chips arranged in a specific configuration.

  • Each light-emitting chip consists of k current sources and light-emitting elements grouped into k light-emitting element groups.
  • The light-emitting elements within each group are supplied with electric current from a corresponding current source.
  • The width of each light-emitting element group in the direction of exposure is optimized based on human vision contrast sensitivity.

Key Features and Innovation:

  • Light-emitting chips with k current sources and grouped light-emitting elements.
  • Optimization of the width of light-emitting element groups based on human vision contrast sensitivity.

Potential Applications:

  • Printing industry for high-quality image reproduction.
  • Semiconductor manufacturing for precise exposure processes.

Problems Solved:

  • Ensures optimal exposure of photosensitive bodies.
  • Improves image quality and accuracy in manufacturing processes.

Benefits:

  • Enhanced image quality.
  • Increased precision in manufacturing processes.

Commercial Applications: The technology can be used in high-end printing equipment and semiconductor manufacturing tools to improve image quality and manufacturing precision.

Prior Art: Further research can be conducted in the field of exposure apparatus design and optimization for photosensitive bodies.

Frequently Updated Research: Stay updated on advancements in exposure apparatus technology and human vision contrast sensitivity studies.

Questions about exposure apparatus technology: 1. How does the optimization of light-emitting element group width improve image quality? 2. What are the potential applications of this exposure apparatus technology in other industries?


Original Abstract Submitted

there is provided an exposure apparatus for exposing a photosensitive body. the exposure apparatus includes light-emitting chips arranged along a first direction parallel to an axial direction of the photosensitive body. each of the light-emitting chips includes: k current sources; and light-emitting elements arranged in the first direction and grouped into k light-emitting element groups. light-emitting elements belonging to a k-th light-emitting element group are supplied with electric current from a k-th current source, where k=1, 2, . . . , k. for every one light-emitting element group out of the k light-emitting element groups, a width occupied in the first direction by the one light-emitting element group is larger than a lower limit value corresponding to a spatial frequency at which contrast sensitivity of human vision represented by a visual transfer function peaks.