Canon kabushiki kaisha (20240231238). EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract
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EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
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EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240231238 titled 'EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
The abstract describes an exposure apparatus for exposing multiple shot regions on a substrate. It includes a projection optical system, a drive mechanism for the substrate, a detector to detect substrate surface height, and a controller to control the drive mechanism based on detector output. The projection optical system projects a pattern onto an exposure region, with the detector's detection region larger than the exposure region. The controller controls the substrate drive based on detector output when one shot region is in the exposure region, for exposing another shot region.
- Projection optical system for exposing shot regions on a substrate
- Drive mechanism to move the substrate
- Detector to measure substrate surface height
- Controller to adjust substrate drive based on detector output
- Detection region of the detector larger than the exposure region
Potential Applications: - Semiconductor manufacturing - Photolithography processes - Printed circuit board production
Problems Solved: - Precise exposure of multiple shot regions on a substrate - Ensuring uniformity in pattern projection
Benefits: - Improved accuracy in exposure processes - Enhanced quality of manufactured products - Increased efficiency in production
Commercial Applications: Title: Advanced Exposure Apparatus for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance the precision and efficiency of exposure processes, leading to higher quality semiconductor products and improved production yields.
Prior Art: Researchers can explore patents related to exposure apparatuses, projection optical systems, and substrate drive mechanisms in the field of semiconductor manufacturing.
Frequently Updated Research: Researchers in the field of photolithography may be conducting studies on improving exposure apparatuses for enhanced semiconductor production processes.
Questions about Exposure Apparatus for Semiconductor Manufacturing: 1. How does the detection region of the detector contribute to the accuracy of the exposure process? 2. What are the potential challenges in integrating this exposure apparatus into existing semiconductor manufacturing systems?
Original Abstract Submitted
an exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. the projection optical system is configured to project a pattern of an original to an exposure region in an image plane of the projection optical system. a detection region of the detector is larger than the exposure region. the controller is configured to control, based on an output of the detector obtained when a first shot region of the plurality of shot regions is arranged in the exposure region, driving of the substrate, by the drive mechanism, for exposing a second shot region of the plurality of shot regions.
