Canon kabushiki kaisha (20240219871). ANALYSIS METHOD simplified abstract
Contents
ANALYSIS METHOD
Organization Name
Inventor(s)
YOSHIHIRO Shiode of Tochigi (JP)
ANALYSIS METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240219871 titled 'ANALYSIS METHOD
Simplified Explanation:
This patent application describes a method for analyzing the manufacturing process of a semiconductor device using data sets to generate learning data and a model to express the process.
- The method involves preparing multiple data sets with input and output for a simulator.
- Learning data is generated based on these data sets, including process information and evaluation information.
- A model is created through learning based on the generated learning data.
Key Features and Innovation:
- Utilizes data sets and simulation to analyze the semiconductor manufacturing process.
- Generates learning data to create a model expressing the process.
- Focuses on process information and evaluation information for analysis.
Potential Applications:
This technology can be applied in the semiconductor industry for optimizing manufacturing processes and improving overall efficiency.
Problems Solved:
- Enhances the understanding of the semiconductor manufacturing process.
- Provides a method for analyzing and improving process control.
Benefits:
- Increased efficiency in semiconductor manufacturing.
- Better control and optimization of the manufacturing process.
Commercial Applications:
Optimizing semiconductor manufacturing processes can lead to cost savings, improved product quality, and increased competitiveness in the market.
Prior Art:
Readers can explore prior research on semiconductor manufacturing process analysis and simulation techniques to understand the existing knowledge in this field.
Frequently Updated Research:
Stay updated on the latest advancements in semiconductor manufacturing process analysis and optimization to leverage cutting-edge technologies for improved outcomes.
Questions about Semiconductor Manufacturing Process Analysis:
1. What are the key challenges in semiconductor manufacturing process analysis? 2. How does this method compare to traditional approaches in semiconductor process optimization?
Original Abstract Submitted
an analysis method of analyzing a process for manufacturing a semiconductor device, includes a preparing step of preparing a plurality of data sets each including an input to a simulator that simulates the process and an output from the simulator, a generating step of generating, based on the plurality of data sets, a plurality of learning data having, as a value of an explanatory variable, a value of information, of process information associated with at least one of control and a state of the process, to which attention is to be paid and a value of evaluation information for evaluating the process as a valued of an objective variable, and a learning step of generating a model expressing the process by performing learning based on the plurality of learning data generated in the generating step.
