Canon kabushiki kaisha (20240210833). IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
MASAYOSHI Fujimoto of Tochigi (JP)
RYOSUKE Hamamoto of Tochigi (JP)
IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240210833 titled 'IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
The present invention involves a method for imprinting a pattern of a composition on a substrate using a mold with a concave-convex pattern.
- Filling the concave portion of the mold with a composition by bringing the mold into contact with the composition on a predetermined region.
- Integrating the composition filling the concave portion of the mold with the composition on the shot region of the substrate.
- Curing the integrated composition.
- Separating the mold from the cured composition.
Potential Applications: This technology can be used in the manufacturing of microelectronics, optics, and other precision devices that require intricate patterns.
Problems Solved: This method allows for the precise transfer of patterns onto substrates, enabling the production of high-quality components with complex designs.
Benefits: The method offers a cost-effective and efficient way to create patterns on substrates, reducing production time and improving overall product quality.
Commercial Applications: This technology can be applied in industries such as semiconductor manufacturing, display technology, and nanotechnology for the production of advanced devices and components.
Prior Art: Researchers can explore prior patents related to nanoimprint lithography and microfabrication techniques to understand the evolution of imprint methods in manufacturing processes.
Frequently Updated Research: Stay informed about advancements in nanoimprint lithography, materials science, and microfabrication techniques to enhance the efficiency and precision of pattern transfer methods.
Questions about the Imprint Method: 1. How does this method compare to traditional lithography techniques in terms of cost and efficiency? 2. What are the key factors to consider when selecting the composition for imprinting patterns on substrates?
Original Abstract Submitted
the present invention provides an imprint method of forming a pattern of a composition on a shot region of a substrate by using a mold having a concave-convex pattern, the method comprising: filling a concave portion of the concave-convex pattern of the mold with a composition by bringing the mold into contact with a composition on a predetermined region and then separating the mold from the predetermined region in a state in which the composition on the predetermined region is uncured; bringing the mold having undergone the filling into contact with a composition on the shot region, thereby integrating the composition filling the concave portion of the concave-convex pattern of the mold with the composition on the shot region; curing an integrated composition obtained in the bringing; and separating the mold from the cured composition obtained in the curing.
