Canon kabushiki kaisha (20240210819). IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
RYOSUKE Hamamoto of Tochigi (JP)
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240210819 titled 'IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
The abstract describes an imprint device that creates a pattern on a substrate using a mold, with an irradiator to irradiate the mold with light and a controller to adjust the light irradiation based on the unevenness of the pattern region.
- The device uses light irradiation to create patterns on a substrate.
- The controller adjusts the light irradiation based on the unevenness of the pattern region.
- It can differentiate between regions with recessed portions exceeding a certain depth and those without.
- The technology ensures that regions with deeper recessed portions receive more light irradiation.
- This innovation allows for precise and accurate patterning on substrates.
Potential Applications: - Semiconductor manufacturing - Nanotechnology research - Optical devices production
Problems Solved: - Ensures uniform and accurate patterning on substrates - Improves the quality and consistency of patterns - Enhances the efficiency of imprinting processes
Benefits: - Increased precision in patterning - Improved quality control - Enhanced productivity in manufacturing processes
Commercial Applications: Title: Advanced Patterning Technology for Semiconductor Manufacturing This technology can be used in the production of semiconductors, optical devices, and other precision manufacturing industries. It offers a more efficient and precise way to create patterns on substrates, leading to improved product quality and production yields.
Prior Art: Researchers can explore prior art related to imprint devices, light irradiation in manufacturing processes, and precision patterning technologies to understand the evolution of this innovation.
Frequently Updated Research: Researchers are constantly exploring new materials and methods to enhance the precision and efficiency of imprint devices. Stay updated on the latest advancements in light-based patterning technologies for manufacturing applications.
Questions about Advanced Patterning Technology: 1. How does this technology improve the efficiency of semiconductor manufacturing processes? This technology enhances the precision and accuracy of patterning on substrates, leading to improved product quality and production yields in semiconductor manufacturing.
2. What are the potential applications of this technology beyond semiconductor manufacturing? This technology can also be applied in nanotechnology research, optical devices production, and other industries requiring precise patterning on substrates.
Original Abstract Submitted
an imprint device that forms a pattern on a shot region of a substrate by using a mold is provided. the imprint device includes an irradiator configured to at least partially irradiate a pattern region of the mold with light, and a controller. the controller is configured to determine a partial region of the pattern region including a boundary between a first region including one or more recessed portions having a depth exceeding a predetermined value and a second region that is adjacent to the first region and does not include a recessed portion having a depth exceeding the predetermined value, based on unevenness information of the pattern region, and set a light irradiation amount to the partial region by the irradiator to be larger than a region other than the partial region.
