Canon kabushiki kaisha (20240210818). IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
SOUSHI Yamaguchi of Tochigi (JP)
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240210818 titled 'IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation: The patent application describes an imprint apparatus that creates patterns on multiple shot regions of a substrate based on the timing of the process.
- The apparatus includes a controller that detects when the time remaining for a process matches a predetermined time.
- Shot regions are divided into different time groups based on the processing time required for each region.
- The controller calculates the total processing time for unprocessed shot regions based on their respective time groups.
Key Features and Innovation:
- Controller detects timing for process completion.
- Shot regions classified into processing time groups.
- Total processing time calculated for unprocessed shot regions.
Potential Applications: This technology can be used in semiconductor manufacturing, nanotechnology, and microelectronics industries for precise patterning on substrates.
Problems Solved: This technology addresses the need for efficient and accurate patterning on substrates with varying processing times for different regions.
Benefits:
- Improved efficiency in imprint processes.
- Enhanced accuracy in pattern formation.
- Reduction in processing time for substrates.
Commercial Applications: The technology can be applied in the production of microchips, sensors, and other electronic components, leading to faster and more precise manufacturing processes.
Prior Art: Readers can explore prior art related to imprint processes, semiconductor manufacturing, and nanotechnology to understand the evolution of similar technologies.
Frequently Updated Research: Stay updated on advancements in imprint technology, semiconductor manufacturing, and nanotechnology to leverage the latest innovations in the field.
Questions about Imprint Apparatus: 1. What are the potential challenges in implementing this technology in large-scale manufacturing processes? 2. How does this technology compare to traditional patterning methods in terms of efficiency and accuracy?
Original Abstract Submitted
an imprint apparatus that forms a pattern on each of a plurality of shot regions of a substrate by performing an imprint process is provided. the apparatus includes a controller configured to detect a timing at which a time until completion of a process of the substrate matches a predetermined time, wherein the plurality of shot regions are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required for a process of each shot region belonging to the processing time group, and wherein the controller is configured to obtain a total time for processing unprocessed shot regions among the plurality of shot regions of the substrate based on the processing time associated with the processing time group to which each of the unprocessed shot regions belongs.
