Canon kabushiki kaisha (20240176250). DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS simplified abstract
DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS
Organization Name
Inventor(s)
ATSUSHI Takagi of Tochigi (JP)
DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240176250 titled 'DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS
Simplified Explanation
The present disclosure describes a method for determining a driving profile of a substrate in scanning exposure for transferring a pattern image from an original to a shot region on the substrate. This involves obtaining information about distortion in an underlying pattern on the shot region, calculating a second driving profile for overlaying the pattern image on the underlying pattern, and generating the first driving profile from the calculated second driving profiles.
- Explanation of the patent:
* Determination method for driving profile of a substrate in scanning exposure * Obtaining information on distortion in underlying pattern * Calculating second driving profiles for overlaying pattern image * Generating first driving profile from calculated second driving profiles
- Potential Applications:**
- Semiconductor manufacturing - Printed circuit board production - Microelectronics fabrication
- Problems Solved:**
- Improving overlay accuracy in pattern transfer - Minimizing distortion in scanned images - Enhancing quality and precision of transferred patterns
- Benefits:**
- Increased efficiency in scanning exposure processes - Enhanced accuracy and alignment of pattern transfer - Reduction in production errors and waste
- Potential Commercial Applications of this Technology:**
- Photolithography equipment manufacturers - Semiconductor fabrication companies - Research institutions in microelectronics
- Possible Prior Art:**
- Prior art may include methods for improving overlay accuracy in scanning exposure processes - Existing technologies for distortion correction in pattern transfer processes
- Unanswered Questions:**
- 1. How does this method compare to existing techniques for driving profile determination in scanning exposure processes?**
- Answer: This article does not provide a direct comparison to existing techniques, leaving the reader to wonder about the specific advantages and differences of this method.
- 2. Are there any limitations or constraints to implementing this method in industrial-scale manufacturing processes?**
- Answer: The article does not address potential challenges or limitations that may arise when applying this method in real-world manufacturing environments, leaving room for further exploration and analysis.
Original Abstract Submitted
the present disclosure provides a determination method of determining a first driving profile of a substrate in scanning exposure of transferring a pattern image of an original to a shot region on the substrate by scan-driving the substrate with respect to slit-shaped light, including obtaining information representing a distortion in an underlaying pattern on the shot region, calculating, for each of a plurality of positions in a non-scanning direction intersecting a scanning direction of the substrate, based on the information obtained in the obtaining, a second driving profile of the substrate for overlaying the pattern image of the original on the underlaying pattern in the scanning exposure, and generating the first driving profile from the second driving profiles each calculated in the calculating for each of the plurality of positions in the non-scanning direction.
