Canon kabushiki kaisha (20240176231). IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM simplified abstract
Contents
- 1 IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM
Organization Name
Inventor(s)
KEIJI Yamashita of Tochigi (JP)
IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240176231 titled 'IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM
Simplified Explanation
The patent application describes an imprint apparatus for forming a pattern on a substrate by bringing the imprint material into contact with a mold. The apparatus includes a holding unit, a supply unit, and a control unit to optimize the imprint process based on measurement data.
- Holding unit holds the substrate during the imprint process.
- Supply unit supplies a droplet of imprint material to a partial region of the substrate, including the edge where the mold pattern will come into contact.
- Control unit determines the position or amount of the droplet based on surface height measurement data of the partial region.
Potential Applications
The technology can be applied in the manufacturing of microelectronics, optical devices, and other precision instruments that require high-resolution patterning.
Problems Solved
1. Achieving precise and accurate patterning on substrates. 2. Improving the efficiency of the imprint process by optimizing material supply.
Benefits
1. Enhanced pattern quality and resolution. 2. Increased production efficiency and yield. 3. Cost-effective manufacturing process.
Potential Commercial Applications
Optimized Imprint Apparatus for High-Resolution Patterning
Possible Prior Art
Prior art in the field of nanoimprint lithography and precision patterning technologies may exist, but specific examples are not provided in the patent application.
Unanswered Questions
What are the specific measurement techniques used to determine the surface height of the partial region in the imprint process?
The patent application does not detail the specific measurement techniques or tools employed to gather surface height data for optimizing the imprint material supply.
How does the control unit adjust the position or amount of the droplet based on the surface height measurement data?
The exact mechanism or algorithm used by the control unit to make adjustments based on the surface height measurement data is not specified in the patent application.
Original Abstract Submitted
an imprint apparatus that performs an imprint process of forming a pattern on an imprint material supplied on a substrate by bringing the imprint material into contact with a mold. the imprint apparatus includes a holding unit configured to hold the substrate, a supply unit configured to supply a droplet of the imprint material to the substrate in a partial region, the partial region including an edge of the substrate and with which a part of a pattern region of the mold is to come into contact in the imprint process, and a control unit configured to determine a position or an amount of the droplet of the imprint material to be supplied to the partial region, based on measurement data on a surface height of the partial region in a state in which the holding unit holds the substrate.
