Canon kabushiki kaisha (20240100853). LIQUID DISCHARGE APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract

LIQUID DISCHARGE APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

Organization Name

canon kabushiki kaisha

Inventor(s)

SHUGO Nakayama of Tokyo (JP)

TOMOFUMI Nishikawara of Tochigi (JP)

AKIKO Iimura of Tochigi (JP)

MASAHIRO Kuri of Tochigi (JP)

TETSUYA Yamamoto of Tochigi (JP)

LIQUID DISCHARGE APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240100853 titled 'LIQUID DISCHARGE APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

Simplified Explanation

The liquid discharge apparatus described in the patent application includes a head for discharging liquid, a chamber to contain the head, a circulation system to circulate gas inside the chamber, an exhaust system to remove the gas outside the chamber, a filter to remove a specific target from the gas, a detection unit to indirectly detect the target by identifying a different target in the gas, and a controller to activate the exhaust system when the concentration of the detected target exceeds a threshold.

• Head for liquid discharge
• Chamber to contain the head
• Circulation system for gas inside the chamber
• Exhaust system to remove gas outside the chamber
• Filter to remove specific target from gas
• Detection unit to indirectly detect target
• Controller to activate exhaust system

1. 1. 1. Potential Applications

- Industrial cleaning processes - Chemical manufacturing - Laboratory experiments

1. 1. 1. Problems Solved

- Efficient removal of specific targets from gas - Control of gas concentration levels - Improved safety in gas handling processes

1. 1. 1. Benefits

- Enhanced gas purification - Increased control over gas emissions - Reduction in environmental impact

1. 1. 1. Potential Commercial Applications
         1. Gas Purification Technology for Industrial Use

1. 1. 1. Possible Prior Art

- Gas filtration systems in industrial settings - Gas detection devices in laboratories

1. 1. 1. 1. Unanswered Questions

1. 1. 1. 1. How does the detection unit indirectly detect the removal target?

The detection unit indirectly detects the removal target by identifying a different target in the gas that is known to be present when the removal target is present as well.

1. 1. 1. 1. What is the threshold for the concentration of the detection target that triggers the exhaust system?

The threshold for the concentration of the detection target that triggers the exhaust system is not specified in the abstract.

Original Abstract Submitted

a liquid discharge apparatus including a head configured to discharge a liquid, a chamber configured to contain the head, a circulation system configured to circulate a gas inside the chamber, an exhaust system configured to operate to exhaust the gas to an outside of the chamber, a filter provided in the circulation system and configured to remove a removal target contained in the gas, a detection unit configured to indirectly detect the removal target by detecting a detection target that is contained in the gas and different from the removal target, and a controller configured to operate the exhaust system when a concentration of the detection target detected by the detection unit is not lower than a threshold.