Boe technology group co., ltd. (20240276855). METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE simplified abstract
Contents
METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE
Organization Name
boe technology group co., ltd.
Inventor(s)
METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240276855 titled 'METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE
The method described in the patent application involves patterning a quantum dot layer using light irradiation to induce coagulation of the quantum dots.
- Formation of a film layer on a substrate containing a photosensitive material and quantum dots with ligands on their surfaces.
- Irradiation of a specific area with light of a preset wavelength to trigger a reaction between the photosensitive material and the ligands on the quantum dots.
- The reaction causes the ligands to detach from the quantum dots, changing their solubility and leading to coagulation.
- Removal of the unirradiated portion of the film layer to create a patterned quantum dot layer in the designated area.
Potential Applications: - Nanotechnology for advanced electronic devices - Optoelectronic devices such as LEDs and solar cells - Biomedical imaging and diagnostics
Problems Solved: - Precise patterning of quantum dots for specific applications - Controlling the solubility and aggregation of quantum dots
Benefits: - Enhanced control over quantum dot placement and properties - Improved performance of quantum dot-based devices - Cost-effective and scalable patterning method
Commercial Applications: Title: Quantum Dot Patterning Technology for Advanced Electronics This technology can be utilized in the production of high-performance electronic devices, optoelectronics, and biomedical tools. The market implications include improved device efficiency, reduced manufacturing costs, and expanded applications in various industries.
Questions about Quantum Dot Patterning Technology: 1. How does this method compare to traditional patterning techniques for quantum dots?
- This method offers precise control over quantum dot placement and aggregation, which can lead to enhanced device performance compared to conventional methods.
2. What are the potential challenges in scaling up this technology for mass production?
- Scaling up may require optimization of the light irradiation process and the removal of unirradiated areas to ensure consistent patterning across large substrates.
Original Abstract Submitted
a method of patterning quantum dot layer includes: forming, on a substrate, a film layer including a photosensitive material and quantum dots with ligands on surfaces of the quantum dots; irradiating a quantum dot reserved area with light of a preset wavelength; where under irradiation with light of the preset wavelength, the photosensitive material or a product of the photosensitive material after light irradiation reacts with the ligands on the surfaces of the quantum dots, to allow the ligands to fall off from the surfaces of the quantum dots, so that solubility of the quantum dots is changed to cause the quantum dots to undergo coagulation; and removing a portion of the film layer which is not irradiated by the light of the preset wavelength, to form a patterned quantum dot portion of the quantum dot layer in the quantum dot reserved area.
