Boe technology group co., ltd. (20240215332). Display Substrate and Preparation Method thereof, and Display Apparatus simplified abstract
Contents
Display Substrate and Preparation Method thereof, and Display Apparatus
Organization Name
boe technology group co., ltd.
Inventor(s)
Display Substrate and Preparation Method thereof, and Display Apparatus - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240215332 titled 'Display Substrate and Preparation Method thereof, and Display Apparatus
The present disclosure introduces a display substrate and its preparation method, along with a display apparatus. The display substrate consists of a circuit layer on a base substrate, an emitting structure layer, and a photoelectric structure layer on one side of the circuit layer. The circuit layer includes at least one impurity absorption layer and at least one transistor, with an active layer in the transistor and insulation layers between the impurity absorption layer and the active layer. The impurity absorption layer has a specific atomic ratio of silicon to nitrogen.
- Circuit layer with impurity absorption layer and transistor
- Specific atomic ratio of silicon to nitrogen in impurity absorption layer
- Insulation layers between impurity absorption layer and active layer
- Display substrate with emitting structure and photoelectric structure layers
- Preparation method for display substrate
Potential Applications: - Display technology for electronic devices - Semiconductor manufacturing industry - Consumer electronics market
Problems Solved: - Improved display performance - Enhanced durability of display substrates - Efficient use of impurity absorption layers
Benefits: - Higher quality display output - Longer lifespan of display substrates - Increased efficiency in semiconductor manufacturing
Commercial Applications: Title: Advanced Display Substrate Technology for Electronic Devices This technology can be utilized in the production of smartphones, tablets, laptops, and other electronic devices requiring high-quality displays. It can also benefit manufacturers in the semiconductor industry looking to enhance their products' performance and durability.
Questions about Display Substrate Technology: 1. How does the specific atomic ratio of silicon to nitrogen in the impurity absorption layer impact display performance? The atomic ratio affects the efficiency of impurity absorption, which in turn influences the overall quality and longevity of the display substrate.
2. What are the key differences between this display substrate technology and traditional methods? This technology offers improved performance and durability due to the unique composition of the impurity absorption layer and the design of the transistor within the circuit layer.
Original Abstract Submitted
the present disclosure provides a display substrate and a preparation method thereof, and a display apparatus. the display substrate includes a circuit layer disposed on a base substrate, an emitting structure layer and a photoelectric structure layer disposed on a side of the circuit layer away from the base substrate, the circuit layer includes at least one impurity absorption layer and at least one transistor, the transistor includes an active layer, and at least one insulation layer is provided between the impurity absorption layer and the active layer; an atomic ratio of a silicon element to a nitrogen element in the impurity absorption layer is 1:5 to 1:35.
