Applied materials, inc. (20240339341). AUTOMATIC CONTROL OF SUBSTRATES simplified abstract
Contents
AUTOMATIC CONTROL OF SUBSTRATES
Organization Name
Inventor(s)
Mauro Cimino of San Jose CA (US)
AUTOMATIC CONTROL OF SUBSTRATES - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240339341 titled 'AUTOMATIC CONTROL OF SUBSTRATES
The present technology aims to improve substrate processing by utilizing methods and systems that involve placing a substrate on a pedestal with multiple heating zones, each having its own heater. The substrate is processed based on an initial recipe with a specific pedestal temperature, and feedback on substrate properties is collected and used as input for a control algorithm.
Key Features and Innovation:
- Utilization of a pedestal with multiple heating zones and independent heaters for improved substrate processing.
- Incorporation of substrate feedback data into a control algorithm to optimize processing.
- Generation of a substrate model through modeling tests to further enhance control algorithm inputs.
- Control of heater power or temperature to achieve targeted substrate properties in different regions.
Potential Applications: This technology can be applied in semiconductor manufacturing, thin film deposition, and other industries requiring precise substrate processing.
Problems Solved: This technology addresses the need for more efficient and accurate substrate processing, leading to improved product quality and yield.
Benefits:
- Enhanced control over substrate processing parameters.
- Increased accuracy in achieving targeted substrate properties.
- Improved overall efficiency and productivity in manufacturing processes.
Commercial Applications: This technology could be valuable in industries such as electronics, solar panels, and optical coatings, where precise substrate processing is crucial for product performance.
Questions about Substrate Processing: 1. How does the use of multiple heating zones on the pedestal improve substrate processing? 2. What are the potential challenges in implementing this technology in large-scale manufacturing operations?
Frequently Updated Research: Researchers are continually exploring new materials and methods to further enhance substrate processing efficiency and accuracy. Stay updated on the latest advancements in this field to maximize the benefits of this technology.
Original Abstract Submitted
the present technology includes methods and systems for improving substrate processing. methods and systems include disposing a substrate on a pedestal that includes a plurality of heating zones each with an independent heater, processing the substrate according to an initial substrate processing recipe that includes an initial pedestal temperature, collecting initial substrate feedback of one or more substrate properties and providing the data as a first input to a substrate control algorithm. methods include generating a substrate model based upon one or more modeling tests of the substrate, providing the generated substrate model as a second input to the substrate control algorithm, controlling the heater power or heater temperature to achieve a targeted substrate property in one or more substrate regions. methods include where the correction is calculated and performed by a processor running the substrate control algorithm based upon the first input and the second input.
