Applied materials, inc. (20240304486). DIFFERENTIAL SUBSTRATE BACKSIDE COOLING simplified abstract
Contents
DIFFERENTIAL SUBSTRATE BACKSIDE COOLING
Organization Name
Inventor(s)
Yogananda Sarode Vishwanath of Bangalore (IN)
DIFFERENTIAL SUBSTRATE BACKSIDE COOLING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240304486 titled 'DIFFERENTIAL SUBSTRATE BACKSIDE COOLING
Simplified Explanation: The patent application describes an electrostatic chuck (ESC) with a ceramic body that has embedded electrodes and multiple concentric regions on its surface. Each region includes a retaining ring and supportive structures to hold a substrate in place. The ESC also has conduits to introduce gas into each region independently, creating positive gas pressure to retain the substrate.
- The electrostatic chuck (ESC) has a ceramic body with embedded electrodes.
- The surface of the ESC is divided into three or more concentric regions.
- Each region has a retaining ring and supportive structures to hold the substrate.
- Conduits in the ceramic body introduce gas into each region independently.
- The gas pressure in each region retains the substrate in place.
Potential Applications: 1. Semiconductor manufacturing 2. Flat panel display production 3. Thin film deposition processes
Problems Solved: 1. Secure retention of substrates during processing 2. Uniform distribution of gas pressure across the substrate surface
Benefits: 1. Improved substrate stability 2. Enhanced process control 3. Increased yield in manufacturing processes
Commercial Applications: The technology can be utilized in industries such as semiconductor manufacturing, flat panel display production, and thin film deposition processes to improve substrate stability and enhance process control, leading to increased yield and efficiency.
Questions about Electrostatic Chuck (ESC): 1. How does the embedded electrode system work in retaining the substrate? 2. What are the advantages of using a ceramic body in the ESC design?
Frequently Updated Research: Ongoing research focuses on optimizing gas pressure distribution in different regions of the ESC to further enhance substrate stability and processing efficiency.
Original Abstract Submitted
an electrostatic chuck (esc) having a ceramic body including embedded electrodes and having a first diameter. three or more regions are defined on a surface and arranged concentrically on the surface, each region includes a retaining ring arranged on the surface and defining an outer edge of the region, and supportive structures arranged on the surface and within the region. the supportive structures are configured to support a surface of a substrate when the substrate is retained by the esc. the esc includes conduits formed in the ceramic body and configured to independently introduce a gas into each region through the ceramic body and to the first surface. each region is configured to retain a corresponding positive gas pressure within the region and the surface of the substrate, and the one or more embedded electrodes are configured to generate a retaining force on the surface of the substrate.
