Applied Materials, Inc. patent applications published on July 25th, 2024
Summary of the patent applications from Applied Materials, Inc. on July 25th, 2024
1. Summary: Applied Materials, Inc. has recently filed patents for innovative methods in semiconductor manufacturing processes. These patents involve techniques such as forming bridge layers in DRAM devices using ion implantation, creating a substrate support carrier with an electrostatic chuck assembly, semiconductor processing with a fluorine-containing precursor, and patterning material layers on substrates. These methods aim to enhance efficiency, precision, and control in manufacturing electronic devices, leading to improved performance and reliability.
2. Key Points of Patents: - Formation of bridge layers in DRAM devices using ion implantation and annealing processes. - Creation of a substrate support carrier with an electrostatic chuck assembly for stable substrate support. - Semiconductor processing involving a fluorine-containing precursor for efficient removal of boron-containing materials. - Patterning material layers on substrates with etching and oxidation processes.
3. Notable Applications: - Manufacturing high-quality DRAM devices for electronic devices like computers and smartphones. - Enhancing semiconductor manufacturing processes with improved temperature control and stability. - Advancing semiconductor fabrication techniques for the production of high-performance electronic devices. - Improving the efficiency and quality of semiconductor materials in various industries.
Contents
- 1 Patent applications for Applied Materials, Inc. on July 25th, 2024
- 1.1 METHOD OF FORMING AN AQUEOUS POLYMER COMPOSITION (18100568)
- 1.2 NOZZLE FOR A DISTRIBUTOR OF A MATERIAL DEPOSITION SOURCE, MATERIAL DEPOSITION SOURCE, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL (18558817)
- 1.3 MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION (18098993)
- 1.4 ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS (18099459)
- 1.5 SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME (18626047)
- 1.6 ADJUSTABLE CROSS-FLOW PROCESS CHAMBER LID (18100326)
- 1.7 PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION (18118499)
- 1.8 Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing (18416304)
- 1.9 FORMATION OF METALLIC FILMS ON ELECTROLESS METAL PLATING OF SURFACES (18099846)
- 1.10 PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS (18101523)
- 1.11 METHOD FOR CONTROLLING LAYER-TO-LAYER THICKNESS IN MULTI-TIER EPITAXIAL PROCESS (18100978)
- 1.12 INDIUM-GALLIUM-NITRIDE LIGHT EMITTING DIODES WITH INCREASED QUANTUM EFFICIENCY (18586297)
- 1.13 MULTI-HEAD OPTICAL INSPECTION SYSTEMS AND TECHNIQUES FOR SEMICONDUCTOR MANUFACTURING (18405546)
- 1.14 APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159214)
- 1.15 APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159208)
- 1.16 APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159222)
- 1.17 FLEXIBLE MULTI-LAYERED COVER LENS STACKS FOR FOLDABLE DISPLAYS (18438084)
- 1.18 PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION (18158370)
- 1.19 SYSTEMS AND METHODS FOR PREDICTING FILM THICKNESS USING VIRTUAL METROLOGY (18624471)
- 1.20 OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DIGITAL CORRECTIONS (ML-DDC) (18439287)
- 1.21 Ion Source For Controlling Decomposition Buildup Using Chlorine Co-Gas (18099353)
- 1.22 Dose Cup Assembly for an Ion Implanter (18101260)
- 1.23 PLASMA EXCITATION WITH ION ENERGY CONTROL (18628009)
- 1.24 Processing Chamber With Multiple Plasma Units (18599767)
- 1.25 REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS (18099039)
- 1.26 BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS (18158379)
- 1.27 INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION (18626864)
- 1.28 METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES (18158916)
- 1.29 DRY ETCH OF BORON-CONTAINING MATERIAL (18098791)
- 1.30 SUBSTRATE SUPPORT CARRIER HAVING MULTIPLE CERAMIC DISCS (18099210)
- 1.31 DRAM Transistor Including Pillars Formed Using Low-Temperature Ion Implant (18100289)
Patent applications for Applied Materials, Inc. on July 25th, 2024
METHOD OF FORMING AN AQUEOUS POLYMER COMPOSITION (18100568)
Main Inventor
Joseph Cameron BYERS
NOZZLE FOR A DISTRIBUTOR OF A MATERIAL DEPOSITION SOURCE, MATERIAL DEPOSITION SOURCE, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL (18558817)
Main Inventor
Julian AULBACH
MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION (18098993)
Main Inventor
Harish V. PENMETHSA
ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS (18099459)
Main Inventor
Jeffrey W. Anthis
SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME (18626047)
Main Inventor
Nitin Pathak
ADJUSTABLE CROSS-FLOW PROCESS CHAMBER LID (18100326)
Main Inventor
Muhannad Mustafa
PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION (18118499)
Main Inventor
Shashidhara Patel H B
Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing (18416304)
Main Inventor
Douglas LONG
FORMATION OF METALLIC FILMS ON ELECTROLESS METAL PLATING OF SURFACES (18099846)
Main Inventor
Chao Liu
PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS (18101523)
Main Inventor
Nimrod SMITH
METHOD FOR CONTROLLING LAYER-TO-LAYER THICKNESS IN MULTI-TIER EPITAXIAL PROCESS (18100978)
Main Inventor
Alexandros ANASTASOPOULOS
INDIUM-GALLIUM-NITRIDE LIGHT EMITTING DIODES WITH INCREASED QUANTUM EFFICIENCY (18586297)
Main Inventor
Michael Chudzik
MULTI-HEAD OPTICAL INSPECTION SYSTEMS AND TECHNIQUES FOR SEMICONDUCTOR MANUFACTURING (18405546)
Main Inventor
Keith Wells
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159214)
Main Inventor
Ala MORADIAN
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159208)
Main Inventor
Ala MORADIAN
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS (18159222)
Main Inventor
Ala MORADIAN
FLEXIBLE MULTI-LAYERED COVER LENS STACKS FOR FOLDABLE DISPLAYS (18438084)
Main Inventor
Manivannan THOTHADRI
PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION (18158370)
Main Inventor
Arvind Shankar Raman
SYSTEMS AND METHODS FOR PREDICTING FILM THICKNESS USING VIRTUAL METROLOGY (18624471)
Main Inventor
Debkalpo Das
OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DIGITAL CORRECTIONS (ML-DDC) (18439287)
Main Inventor
Tamer COSKUN
Ion Source For Controlling Decomposition Buildup Using Chlorine Co-Gas (18099353)
Main Inventor
Mateo Navarro Goldaraz
Dose Cup Assembly for an Ion Implanter (18101260)
Main Inventor
Frank Sinclair
PLASMA EXCITATION WITH ION ENERGY CONTROL (18628009)
Main Inventor
Yang YANG
Processing Chamber With Multiple Plasma Units (18599767)
Main Inventor
Kazuya Daito
REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS (18099039)
Main Inventor
Wenting HOU
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS (18158379)
Main Inventor
Jian Li
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION (18626864)
Main Inventor
Naomi Yoshida
METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES (18158916)
Main Inventor
Mang-Mang LING
DRY ETCH OF BORON-CONTAINING MATERIAL (18098791)
Main Inventor
Yeonju Kwak
SUBSTRATE SUPPORT CARRIER HAVING MULTIPLE CERAMIC DISCS (18099210)
Main Inventor
Arvinder Manmohan Singh CHADHA
DRAM Transistor Including Pillars Formed Using Low-Temperature Ion Implant (18100289)
Main Inventor
Sipeng Gu
