Applied Materials, Inc. patent applications published on August 22nd, 2024
Summary of the patent applications from Applied Materials, Inc. on August 22nd, 2024
- Summary:**
Applied Materials, Inc. has recently filed patents for innovative technologies in the fields of display applications, semiconductor manufacturing, and super junction devices. These patents focus on improving light emission control in displays, enhancing electrical properties of chamber components, and increasing manufacturing efficiency of super junction devices. The key features include directional light-emitting diodes, dissipative coatings, and trench formation techniques. These patents offer benefits such as enhanced image quality, improved electrical properties, and increased device performance.
- Key Points of Patents:**
- Directional light-emitting diode for precise light control in displays.
- Dissipative coating for chamber components to prevent damage from electrostatic discharge.
- Trench formation technique for rapid manufacturing of super junction devices.
- Notable Applications:**
- Enhanced image quality and energy efficiency in display technologies.
- Improved reliability and protection against electrostatic discharge in semiconductor manufacturing.
- Increased manufacturing throughput and efficiency in super junction device fabrication.
Contents
- 1 Patent applications for Applied Materials, Inc. on August 22nd, 2024
- 1.1 MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS (18108327)
- 1.2 DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING (18568993)
- 1.3 SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT (18171598)
- 1.4 PHYSICAL LAYOUT SYNTHESIS FOR STANDARD CELLS USING SLICE LAYOUTS (18170335)
- 1.5 MODULAR HIGH-FREQUENCY SOURCE (18652609)
- 1.6 FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN (18653097)
- 1.7 PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY (18110668)
- 1.8 TREATMENTS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATERIAL SURFACE ROUGHNESS (18112252)
- 1.9 METHODS OF SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH ACTIVE STEAM GENERATION (18653955)
- 1.10 LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT (18172149)
- 1.11 INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL (18419526)
- 1.12 ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION (18109365)
- 1.13 Layered Substrate with Ruthenium Layer and Method for Producing (18112564)
- 1.14 SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE (18171090)
- 1.15 SILICON SUPER JUNCTION STRUCTURES FOR INCREASED THROUGHPUT (18171119)
- 1.16 ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMICONDUCTOR PROCESS TOOLS (18648278)
- 1.17 POLARIZER-FREE LED DISPLAYS (18642519)
Patent applications for Applied Materials, Inc. on August 22nd, 2024
MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS (18108327)
Main Inventor
Chandan Kr Barik
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING (18568993)
Main Inventor
CHI-MING TSAI
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT (18171598)
Main Inventor
Chi-Ming TSAI
PHYSICAL LAYOUT SYNTHESIS FOR STANDARD CELLS USING SLICE LAYOUTS (18170335)
Main Inventor
Martinus Maria Berkens
MODULAR HIGH-FREQUENCY SOURCE (18652609)
Main Inventor
Thai Cheng Chua
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN (18653097)
Main Inventor
Lara HAWRYLCHAK
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY (18110668)
Main Inventor
Sathiyamurthi GOVINDASAMY
TREATMENTS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATERIAL SURFACE ROUGHNESS (18112252)
Main Inventor
Bin Yao
METHODS OF SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH ACTIVE STEAM GENERATION (18653955)
Main Inventor
Chaitanya Anjaneyalu Prasad
LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT (18172149)
Main Inventor
Rupankar CHOUDHURY
INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL (18419526)
Main Inventor
Xi CEN
ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION (18109365)
Main Inventor
Zachary J. Devereaux
Layered Substrate with Ruthenium Layer and Method for Producing (18112564)
Main Inventor
Zhaoxuan WANG
SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE (18171090)
Main Inventor
Amirhasan NOURBAKHSH
SILICON SUPER JUNCTION STRUCTURES FOR INCREASED THROUGHPUT (18171119)
Main Inventor
Amirhasan Nourbakhsh
ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMICONDUCTOR PROCESS TOOLS (18648278)
Main Inventor
Gayatri Natu
POLARIZER-FREE LED DISPLAYS (18642519)
Main Inventor
Chung-Chih Wu
