Applied Materials, Inc. (20240410773). Integrated Pressure Sensor for Process Chamber Assemblies
Contents
Integrated Pressure Sensor for Process Chamber Assemblies
Organization Name
Inventor(s)
Chih-Yang Chang of Santa Clara CA (US)
Shantanu Rajiv Gadgil of Santa Clara CA (US)
Chien-Min Liao of San Jose CA (US)
Shannon Wang of Santa Clara CA (US)
Yao-Hung Yang of Santa Clara CA (US)
Tom K. Cho of Los Altos CA (US)
Integrated Pressure Sensor for Process Chamber Assemblies
This abstract first appeared for US patent application 20240410773 titled 'Integrated Pressure Sensor for Process Chamber Assemblies
Original Abstract Submitted
methods and apparatus provide in-situ pressure sensors for apparatus used in semiconductor manufacturing processes. in some embodiments, the apparatus may comprise a showerhead body, a first gas channel of the showerhead body, a second gas channel of the showerhead body, one or more first gas pressure sensors positioned on a surface of the first gas channel, and one or more second gas pressure sensors positioned on a surface of the second gas channel. the apparatus may be formed by additive manufacturing including the pressure sensors and electrical connections to the pressure sensors. in some embodiments, a controller may be utilized to control semiconductor processes based on the pressure readings from the in-situ pressure sensors.
