ASML NETHERLANDS B.V. patent applications published on July 11th, 2024

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Summary of the patent applications from ASML NETHERLANDS B.V. on July 11th, 2024

1. **Summary**: ASML NETHERLANDS B.V. has recently filed patents for innovative technologies in semiconductor inspection and manufacturing processes. These patents focus on advanced detector technology, substrate restraint systems, and charged particle beam projection methods. The detector technology enhances detection capabilities in scanning electron microscopes, while the substrate restraint system ensures precise positioning and stability during manufacturing processes. The charged particle beam projection method allows for efficient manipulation of multiple sub-beams, leading to improved accuracy in projecting charged particle beams.

2. **Key Points of Patents**:

  * Detector technology for CD-SEM and review SEM systems with a semiconductor structure and top electrode for detecting electrons or radiation.
  * Substrate restraint system with springs for precise positioning and stability of substrates during manufacturing processes.
  * Charged particle beam projection method using control lens array and beam shaping aperture array for efficient manipulation of sub-beams.

3. **Notable Applications**:

  * Semiconductor manufacturing for quality control and process optimization.
  * Nanotechnology research for materials analysis and characterization.
  * Enhanced accuracy and efficiency in substrate handling and charged particle beam projection processes.



Patent applications for ASML NETHERLANDS B.V. on July 11th, 2024

DARK FIELD MICROSCOPE (18441710)

Main Inventor

Sebastianus Adrianus GOORDEN


Method and Apparatus for Coherence Scrambling in Metrology Applications (17768851)

Main Inventor

Zili ZHOU


METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS (18277223)

Main Inventor

Niek Willem KLEIN KOERKAMP


OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF (18279694)

Main Inventor

Bram Paul Theodoor VAN GOCH


LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS (18612659)

Main Inventor

Marinus Petrus REIJNDERS


METROLOGY METHOD AND APPARATUS (18413910)

Main Inventor

Arjan Johannes Anton BEUKMAN


ALIGNING A DISTORTED IMAGE (18415596)

Main Inventor

Maxim PISARENCO


CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD (18402585)

Main Inventor

Erwin SLOT


SUBSTRATE RESTRAINING SYSTEM (18547470)

Main Inventor

Marinus Augustinus Christiaan VERSCHUREN


SEMICONDUCTOR DETECTOR AND METHOD OF FABRICATING SAME (18499141)

Main Inventor

Gianpaolo LORITO