20240053691. TONER AND METHOD FOR PRODUCING TONER simplified abstract (CANON KABUSHIKI KAISHA)
Contents
TONER AND METHOD FOR PRODUCING TONER
Organization Name
Inventor(s)
KENTA Kamikura of Kanagawa (JP)
SATOSHI Arimura of Shizuoka (JP)
TONER AND METHOD FOR PRODUCING TONER - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240053691 titled 'TONER AND METHOD FOR PRODUCING TONER
Simplified Explanation
The abstract describes a toner composition containing two types of resins, a vinyl resin with a sulfonic acid-type group (resin a) and a polyester resin (resin b). The composition is analyzed using time-of-flight secondary ion mass spectrometry to determine the distribution of the resins within the toner particles.
- The toner composition includes resin a (vinyl resin with sulfonic acid-type group) and resin b (polyester resin).
- Analysis using time-of-flight secondary ion mass spectrometry helps determine the distribution of the resins within the toner particles.
- Specific relationships between the abundances of resin a and resin b at different depths within the toner particles are defined and satisfied.
- Potential Applications
- Printing industry for high-quality and precise printing.
- Toner manufacturing for improved toner performance.
- Problems Solved
- Ensures proper distribution of resins within toner particles.
- Helps in optimizing toner composition for better printing results.
- Benefits
- Enhanced printing quality.
- Improved toner performance and efficiency.
Original Abstract Submitted
a toner comprising a toner particle comprising a resin a and a resin b; wherein: the resin a is a vinyl resin having a sulfonic acid-type group, the resin b is a polyester resin; and when in analysis of the toner particle using time-of-flight secondary ion mass spectrometry, da (nm) is defined as a depth at which an abundance of the resin a in a depth of 10 nm from a toner particle surface is a maximum, ca(%) is defined as an abundance of the resin a at the depth da, cb(%) is defined as an abundance of the resin b at the depth da, ca(%) is defined as an abundance of the resin a at a depth of 75 nm and cb(%) is defined as an abundance of the resin b at a depth of 75 nm, ca, ca, cband cbsatisfy specific relationships.