20240027893. PELLICLE AND PELLICLE ASSEMBLY simplified abstract (ASML NETHERLANDS B.V.)

PELLICLE AND PELLICLE ASSEMBLY

Organization Name

ASML NETHERLANDS B.V.

Inventor(s)

David Ferdinand Vles of Eindhoven (NL)

Chaitanya Krishna Ande of Eindhoven (NL)

Antonius Franciscus Johannes De Groot of Someren (NL)

Adrianus Johannes Maria Giesbers of Vlijmen (NL)

Johannes Joseph Janssen of Beesel (NL)

Paul Janssen of Eindhoven (NL)

Johan Hendrik Klootwijk of Eindhoven (NL)

Peter Simon Antonius Knapen of Deurne (NL)

Evgenia Kurganova of Nijmegen (NL)

Marcel Peter Meijer of Eindhoven (NL)

Wouter Rogier Meijerink of Eindhoven (NL)

Maxim Aleksandrovich Nasalevich of Eindhoven (NL)

Arnoud Willem Notenboom of Rosmalen (NL)

Raymond Olsman of Bennekom (NL)

Hrishikesh Patel of Eindhoven (NL)

[[:Category:Mária P�ter of Eindhoven (NL)|Mária P�ter of Eindhoven (NL)]][[Category:Mária P�ter of Eindhoven (NL)]]

Gerrit Van Den Bosch of Geldermalsen (NL)

Wilhelmus Theodorus Anthonius Johannes Van Den Einden of Deurne (NL)

Willem Joan Van Der Zande of Bussum (NL)

Pieter-Jan Van Zwol of Eindhoven (NL)

Johannes Petrus Martinus Bernardus Vermeulen of Leende (NL)

Willem-Pieter Voorthuijzen of 's-Hertogenbosch (NL)

Hendrikus Jan Wondergem of Veldhoven (NL)

Aleksandar Nikolov Zdravkov of Eindhoven (NL)

PELLICLE AND PELLICLE ASSEMBLY - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240027893 titled 'PELLICLE AND PELLICLE ASSEMBLY

Simplified Explanation

The abstract describes a patent application for a pellicle assembly used in a patterning device. The assembly includes a frame onto which a pellicle is attached, and it also includes three-dimensional expansion structures that allow the pellicle to expand under stress. Additionally, the assembly includes actuators for moving the assembly towards and away from the patterning device.

• The pellicle assembly is designed to attach a pellicle onto a frame.
• The assembly includes three-dimensional expansion structures that enable the pellicle to expand when subjected to stress.
• The assembly also includes actuators that can move the assembly towards and away from the patterning device.

Potential applications of this technology:

• Semiconductor manufacturing: The pellicle assembly can be used in the production of semiconductor devices to protect the patterned features during the manufacturing process.
• Photolithography: The assembly can be used in photolithography processes to prevent contaminants from reaching the photomask and affecting the quality of the pattern transfer.

Problems solved by this technology:

• Contamination prevention: The pellicle assembly helps to protect the patterning device from contaminants, ensuring the quality and accuracy of the pattern transfer.
• Stress management: The three-dimensional expansion structures allow the pellicle to expand under stress, reducing the risk of damage to the pellicle or the patterned features.

Benefits of this technology:

• Improved yield: By preventing contamination and managing stress, the pellicle assembly helps to improve the yield of semiconductor manufacturing processes.
• Enhanced pattern transfer: The assembly ensures the accurate transfer of patterns by protecting the photomask from contaminants and minimizing stress-induced distortions.

Original Abstract Submitted

a pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. the pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. a pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.