20240014028. ULTRAVIOLET AND OZONE CLEAN SYSTEM simplified abstract (Applied Materials, Inc.)

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ULTRAVIOLET AND OZONE CLEAN SYSTEM

Organization Name

Applied Materials, Inc.

Inventor(s)

Banqiu Wu of San Jose CA (US)

Khalid Makhamreh of Los Gatos CA (US)

Hiroki Ogawa of Yokohama (JP)

Eliyahu Shlomo Dagan of Sunnyvale CA (US)

ULTRAVIOLET AND OZONE CLEAN SYSTEM - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240014028 titled 'ULTRAVIOLET AND OZONE CLEAN SYSTEM

Simplified Explanation

The abstract describes a cleaning apparatus that uses ultraviolet radiation to clean a substrate. The apparatus includes a lamp that emits ultraviolet radiation, a housing that contains the lamp, and a water deflector positioned below the housing. The water deflector has a water inlet for receiving ozonated water and a water outlet for discharging the ozonated water onto the substrate. The apparatus also includes an upper reflector above the lamp and a lower reflector below the water deflector. The upper and lower reflectors help direct the ultraviolet radiation towards the water flow path, while the lower reflector shields the substrate from direct exposure to the ultraviolet radiation.

  • The apparatus uses ultraviolet radiation and ozonated water to clean a substrate.
  • The water deflector helps distribute the ozonated water onto the substrate.
  • The upper and lower reflectors help direct the ultraviolet radiation towards the water flow path.
  • The lower reflector protects the substrate from direct exposure to the ultraviolet radiation.

Potential applications of this technology:

  • Cleaning and disinfecting surfaces, such as in hospitals, laboratories, and food processing facilities.
  • Removing contaminants and pollutants from water or air.
  • Sterilizing medical equipment and devices.

Problems solved by this technology:

  • Provides an efficient and effective method for cleaning and disinfecting substrates.
  • Reduces the need for chemical cleaning agents.
  • Minimizes the risk of cross-contamination.

Benefits of this technology:

  • Faster and more thorough cleaning compared to traditional methods.
  • Environmentally friendly, as it reduces the use of chemicals.
  • Improves hygiene and reduces the spread of infections.
  • Can be automated for increased efficiency and consistency.


Original Abstract Submitted

a cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.

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