18973801. Vapor Chamber and Electronic Device (HUAWEI TECHNOLOGIES CO., LTD.)
Vapor Chamber and Electronic Device
Organization Name
Inventor(s)
Vapor Chamber and Electronic Device
This abstract first appeared for US patent application 18973801 titled 'Vapor Chamber and Electronic Device
Original Abstract Submitted
A vapor chamber includes a housing, a capillary structure, and a working fluid. Both the capillary structure and the working fluid are located in the housing. An area of a surface of the capillary structure in contact with an inner surface of the housing is less than an area of the inner surface. The housing has a cavity. The working fluid in a liquid state is located in the capillary structure. The working fluid in a gaseous state is located in the cavity. The housing includes a first region and a second region. The capillary structure includes a first part located in the first region and a second part located in the second region. The second part includes a trunk structure and a branch structure.