18965312. SUBSTRATE PROCESSING MONITORING (Applied Materials, Inc.)
SUBSTRATE PROCESSING MONITORING
Organization Name
Inventor(s)
Zuoming Zhu of Sunnyvale CA US
Shu-Kwan Lau of Sunnyvale CA US
Ala Moradian of Sunnyvale CA US
Flora Fong-Song Chang of Saratoga CA US
Vilen K. Nestorov of Pleasanton CA US
Bindusagar Marath Sankarathodi of San Jose CA US
Maxim D. Shaposhnikov of Sunnyvale CA US
Surendra Singh Srivastava of Santa Clara CA US
Zhepeng Cong of San Jose CA US
Patricia M. Liu of Saratoga CA US
Errol Antonio C. Sanchez of Tracy CA US
Jenny C. Lin of Saratoga CA US
Schubert S. Chu of San Francisco CA US
Balakrishnam R. Jampana of San Jose CA US
SUBSTRATE PROCESSING MONITORING
This abstract first appeared for US patent application 18965312 titled 'SUBSTRATE PROCESSING MONITORING
Original Abstract Submitted
A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.
- Applied Materials, Inc.
- Zuoming Zhu of Sunnyvale CA US
- Shu-Kwan Lau of Sunnyvale CA US
- Ala Moradian of Sunnyvale CA US
- Enle Choo of Saratoga CA US
- Flora Fong-Song Chang of Saratoga CA US
- Vilen K. Nestorov of Pleasanton CA US
- Zhiyuan Ye of San Jose CA US
- Bindusagar Marath Sankarathodi of San Jose CA US
- Maxim D. Shaposhnikov of Sunnyvale CA US
- Surendra Singh Srivastava of Santa Clara CA US
- Zhepeng Cong of San Jose CA US
- Patricia M. Liu of Saratoga CA US
- Errol Antonio C. Sanchez of Tracy CA US
- Jenny C. Lin of Saratoga CA US
- Schubert S. Chu of San Francisco CA US
- Balakrishnam R. Jampana of San Jose CA US
- H01L21/66
- H01L21/67
- CPC H01L22/26