18964699. NITRIDE SEMICONDUCTOR DEVICE (ROHM CO., LTD.)

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NITRIDE SEMICONDUCTOR DEVICE

Organization Name

ROHM CO., LTD.

Inventor(s)

Hirotaka Otake of Kyoto JP

Shinya Takado of Kyoto JP

Taketoshi Tanaka of Kyoto JP

Norikazu Ito of Kyoto JP

NITRIDE SEMICONDUCTOR DEVICE

This abstract first appeared for US patent application 18964699 titled 'NITRIDE SEMICONDUCTOR DEVICE

Original Abstract Submitted

A nitride semiconductor device includes a first nitride semiconductor layer that constitutes an electron transit layer, a second nitride semiconductor layer that is formed on the first nitride semiconductor layer, is larger in bandgap than the first nitride semiconductor layer, and constitutes an electron supply layer, and a gate portion that is formed on the second nitride semiconductor layer. The gate portion includes a first semiconductor gate layer of a ridge shape that is disposed on the second nitride semiconductor layer and is constituted of a nitride semiconductor containing an acceptor type impurity, a second semiconductor gate layer that is formed on the first semiconductor gate layer and is constituted of a nitride semiconductor with a larger bandgap than the first semiconductor gate layer, and a gate electrode that is formed on the second semiconductor gate layer and is in Schottky junction with the second semiconductor gate layer.