18955235. PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION (CANON KABUSHIKI KAISHA)
Contents
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
Organization Name
Inventor(s)
Timothy Stachowiak of Austin TX (US)
Keiji Yamashita of Tochigi (JP)
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
This abstract first appeared for US patent application 18955235 titled 'PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
Original Abstract Submitted
A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.
