18821843. LOW OPEN AREA AND COUPON ENDPOINT DETECTION (Applied Materials, Inc.)
Contents
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
Organization Name
Inventor(s)
Varoujan Chakarian of San Jose CA (US)
Blake W Erickson of Gilroy CA (US)
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
This abstract first appeared for US patent application 18821843 titled 'LOW OPEN AREA AND COUPON ENDPOINT DETECTION
Original Abstract Submitted
The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more sub-arrays of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tubes (PMT), specifically multi-anode PMT.
