18815687. ATOMIC LAYER DEPOSITION PART COATING CHAMBER (Applied Materials, Inc.)

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

Organization Name

Applied Materials, Inc.

Inventor(s)

Michael R. Rice of Pleasanton CA (US)

Hanish Kumar Panavalappil Kumarankutty of Bangalore (IN)

Steven D. Marcus of San Jose CA (US)

Kirubanandan Naina Shanmugam of Bangalore (IN)

Sriharsha Dharmapura Sathyanarayanamurthy of Bengaluru (IN)

Madhukar Krishna of Bengaluru (IN)

Shivaprakash Padadayya Hiremath of Bangalore (IN)

Senthil Kumar Nattamai Subramanian of Hosur (IN)

Sankar Menon Cherubala Pathayapura

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

This abstract first appeared for US patent application 18815687 titled 'ATOMIC LAYER DEPOSITION PART COATING CHAMBER

Original Abstract Submitted

Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a method for coating a part via atomic layer deposition includes: fastening a workpiece to be coated to an interior volume facing portion of a part coating reactor; and performing an ALD process on the fastened workpiece within the part coating reactor.