18814175. APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES (Tokyo Electron Limited)
Contents
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
Organization Name
Inventor(s)
Mirko Vukovic of Albany NY (US)
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
This abstract first appeared for US patent application 18814175 titled 'APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
Original Abstract Submitted
A substrate processing system includes a processing chamber, a substrate holder configured to hold and rotate a substrate about an axis perpendicular to a working surface of the substrate; an electron emitter adapted to emit a first electron beam directed at a first surface of a peripheral region of the substrate, the first electron beam having a first beam energy and a first beam current sufficient to vaporize material from the first surface of the peripheral region of the substrate; an airflow system configured to direct a flow of gas across the working surface of the substrate; and an exhaust system configured to collect the gas comprising the material vaporized from the peripheral region.
