18712671. SURROUNDING PATTERN AND PROCESS AWARE METROLOGY (ASML Netherlands B.V.)
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SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
Organization Name
Inventor(s)
Huaichen Zhang of Eindhoven (NL)
Ruben Cornelis Maas of Houten (NL)
Syam Parayil Venugopalan of Eindhoven (NL)
Jan Wouter Bijlsma of Veldhoven (NL)
SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
This abstract first appeared for US patent application 18712671 titled 'SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
Original Abstract Submitted
A method and system for designing a mark for use in imaging of a pattern on a substrate using a lithographic process in a lithographic apparatus. The method includes obtaining a mark construction, obtaining a spatial variation of a geometric parameter associated with the mark construction, and determining a geometry design of individual patterns of a mark based on the spatial variation and a spatial location of the mark.
