18677562. Method for preparing cover substrate simplified abstract (InnoLux Corporation)
Contents
Method for preparing cover substrate
Organization Name
Inventor(s)
Ying-Yao Tang of Miao-Li County (TW)
Chin-Lung Ting of Miao-Li County (TW)
Method for preparing cover substrate - A simplified explanation of the abstract
This abstract first appeared for US patent application 18677562 titled 'Method for preparing cover substrate
Simplified Explanation: The patent application describes a method for preparing a cover substrate by treating an anti-reflection film with fluoride-based plasma to form a hydrophobic layer.
- The method involves providing a substrate with an anti-reflection film that includes a first layer containing silicon oxide.
- The first layer of the anti-reflection film is treated with fluoride-based plasma, where a fluorine-containing radical reacts with the silicon oxide to form a hydrophobic layer.
- The fluoride-based plasma is decomposed from a fluoride-based compound using microwave, such as NFor SF.
- The resulting hydrophobic layer improves the water-repellent properties of the cover substrate.
Key Features and Innovation:
- Treatment of anti-reflection film with fluoride-based plasma.
- Formation of a hydrophobic layer on the first layer of the film.
- Use of microwave to decompose fluoride-based compound.
- Improvement of water-repellent properties of the cover substrate.
Potential Applications: This technology can be applied in the manufacturing of electronic devices, optical lenses, and solar panels where water resistance is crucial.
Problems Solved: This technology addresses the issue of water damage to cover substrates by enhancing their hydrophobic properties.
Benefits:
- Increased durability and longevity of cover substrates.
- Improved performance in outdoor or wet conditions.
- Reduced maintenance and cleaning requirements.
Commercial Applications: The technology can be utilized in the production of smartphones, tablets, cameras, and other electronic devices to enhance their water resistance and durability, potentially appealing to consumers in various industries.
Questions about Cover Substrate Treatment: 1. How does the fluoride-based plasma treatment improve the water-repellent properties of the cover substrate? 2. What are the specific advantages of using microwave to decompose the fluoride-based compound in the process?
Original Abstract Submitted
A method for preparing a cover substrate is provided. The method includes the following steps: providing a substrate with an anti-reflection film formed thereon, wherein the anti-reflection film includes a first layer, and the first layer includes silicon oxide; and treating the first layer of the anti-reflection film with fluoride-based plasma to form a hydrophobic layer on the first layer, wherein a fluorine-containing radical in the fluoride-based plasma is reacted with the silicon oxide in the first layer to form the hydrophobic layer, wherein the fluoride-based plasma is decomposed from a fluoride-based compound by using microwave, and the fluoride-based compound includes NFor SF.
