18676513. ETCHING DEVICE simplified abstract (CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED)
Contents
- 1 ETCHING DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ETCHING DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Etching Devices
- 1.13 Original Abstract Submitted
ETCHING DEVICE
Organization Name
CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
Inventor(s)
ETCHING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18676513 titled 'ETCHING DEVICE
Simplified Explanation
The etching device described in the patent application consists of a porous roller and a pressing roller. The porous roller is a hollow structure with openings at both ends, filled with etching liquid, and has multiple openings on its surface. The pressing roller is attached to the porous roller and presses a metal layer onto the porous roller's surface. As the porous roller rotates, the etching liquid passes through its openings, continuously etching the metal layer in contact with the openings.
- The etching device includes a porous roller with openings and etching liquid, as well as a pressing roller for attaching a metal layer.
- The porous roller's rotation allows the etching liquid to continuously etch the metal layer in contact with its openings.
Key Features and Innovation
- Porous roller with openings for etching liquid flow.
- Pressing roller for attaching metal layer.
- Continuous etching process during rotation.
Potential Applications
This technology can be used in the manufacturing of printed circuit boards, semiconductor devices, and other electronic components that require precise etching processes.
Problems Solved
This technology addresses the need for a cost-effective and simplified method of creating opening structures through etching processes.
Benefits
- Cost-effective etching process.
- Simplified opening structure creation.
- Precise and continuous etching.
Commercial Applications
- Electronics manufacturing industry for PCBs and semiconductor devices.
- Research and development labs for prototyping and testing.
- Metalworking industry for precision etching processes.
Prior Art
Readers interested in prior art related to this technology can explore patents and research papers on etching devices, roller-based etching systems, and metal layer etching processes.
Frequently Updated Research
Stay updated on advancements in etching technology, porous materials research, and industrial applications of roller-based etching systems.
Questions about Etching Devices
What are the potential cost savings associated with using this etching device?
The use of this etching device can lead to cost savings due to its simplified process and continuous etching capabilities.
How does this technology compare to traditional etching methods in terms of efficiency and precision?
This technology offers improved efficiency and precision compared to traditional etching methods, thanks to its continuous etching process and controlled liquid flow.
Original Abstract Submitted
Provided an etching device that is capable of effectively realizing an opening structure with low cost and simplified process. The etching device includes: a porous roller, the porous roller being a hollow structure with openings at both ends, an etching liquid being accommodated in the hollow structure, and the porous roller being provided with a plurality of openings; a pressing roller, attached to the porous roller and arranged above the liquid level of the etching liquid, for pressing and attaching a metal layer to be etched onto the surface of the porous roller; wherein during rotation of the porous roller, the etching liquid passes through at least part of the openings of the plurality of openings and continuously soaks the metal layer in contact with the at least part of the openings, so as to continuously etch the metal layer in contact with the at least part of the openings.
