18671680. PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS simplified abstract (Tokyo Electron Limited)
Contents
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
Organization Name
Inventor(s)
Jianping Zhao of Austin TX (US)
John Carroll of Austin TX (US)
Charles Schlechte of Austin TX (US)
Peter Lowell George Ventzek of Austin TX (US)
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18671680 titled 'PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
The abstract describes a plasma system with a plasma apparatus containing a plasma chamber and a substrate support, as well as an electromagnetic (EM) circuit block connected to a radio frequency (RF) electrode. The EM circuit block includes a broadband RF waveform function generator and a broadband impedance matching network to distribute EM power over a range of frequencies.
- The plasma system includes a plasma chamber and a substrate support.
- An electromagnetic (EM) circuit block is connected to a radio frequency (RF) electrode.
- The EM circuit block consists of a broadband RF waveform function generator.
- A broadband impedance matching network is included to distribute EM power over a range of frequencies.
- A controller is programmed to adjust input parameters of the EM circuit block.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Surface modification processes
Problems Solved: - Efficient distribution of EM power over a range of frequencies - Improved control over plasma processes - Enhanced substrate treatment capabilities
Benefits: - Increased process efficiency - Enhanced plasma uniformity - Improved substrate treatment quality
Commercial Applications: Title: Advanced Plasma System for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance thin film deposition processes, leading to higher quality semiconductor devices. The market implications include improved production yields and reduced manufacturing costs.
Questions about Plasma Systems: 1. How does the broadband impedance matching network improve the performance of the plasma system? The broadband impedance matching network ensures efficient distribution of EM power over a range of frequencies, leading to enhanced control and uniformity in plasma processes.
2. What role does the controller play in adjusting input parameters of the EM circuit block? The controller is programmed to optimize the performance of the plasma system by adjusting various input parameters of the EM circuit block, allowing for precise control over the plasma processes.
Original Abstract Submitted
A plasma system includes a plasma apparatus comprising a plasma chamber and a substrate support disposed in the plasma chamber. The system includes an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block includes a broadband RF waveform function generator, the broadband RF waveform having EM power distributed over a range of frequencies, and a broadband impedance matching network having an input coupled to an output of the broadband RF waveform function generator and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies. The system includes a controller programmed to adjust an input parameter of the EM circuit block.
