18671060. THIN FILM TRANSISTOR AND DISPLAY DEVICE simplified abstract (Japan Display Inc.)

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THIN FILM TRANSISTOR AND DISPLAY DEVICE

Organization Name

Japan Display Inc.

Inventor(s)

Masashi Tsubuku of Minato-ku (JP)

Tatsuya Toda of Minato-ku (JP)

THIN FILM TRANSISTOR AND DISPLAY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18671060 titled 'THIN FILM TRANSISTOR AND DISPLAY DEVICE

Simplified Explanation: The patent application describes a thin film transistor with an active layer made of an oxide semiconductor containing indium and gallium, along with a gate electrode, a first gate insulating layer, and a second gate insulating layer made of a hydrogen block layer.

Key Features and Innovation:

  • Active layer made of an oxide semiconductor with indium and gallium.
  • Inclusion of a hydrogen block layer as the second gate insulating layer.
  • Utilization of a thin film transistor design.

Potential Applications: The technology can be used in:

  • Display panels
  • Touchscreen devices
  • Electronic circuits

Problems Solved:

  • Improved performance and stability of thin film transistors.
  • Enhanced efficiency in electronic devices.

Benefits:

  • Higher performance levels.
  • Increased durability and stability.
  • Potential cost-effectiveness in production.

Commercial Applications: The technology can be applied in various industries such as consumer electronics, telecommunications, and automotive for improved device performance and efficiency.

Prior Art: Readers can explore prior research on thin film transistors, oxide semiconductors, and hydrogen block layers to understand the background of this innovation.

Frequently Updated Research: Stay updated on advancements in oxide semiconductor technology, thin film transistor design, and gate insulating layers for potential improvements in performance and applications.

Questions about Thin Film Transistors: 1. How do thin film transistors differ from traditional transistors? 2. What are the advantages of using oxide semiconductors in thin film transistors?


Original Abstract Submitted

A thin film transistor including: an active layer formed of an oxide semiconductor including at least indium and gallium; a gate electrode; a first gate insulating layer disposed between the active layer and the gate electrode on the gate electrode side; and a second gate insulating layer, which is a hydrogen block layer, disposed between the active layer and the gate electrode on the active layer side.