18658522. REFLECTIVE MASK simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
REFLECTIVE MASK
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Hsin-Chang Lee of Hsinchu (TW)
REFLECTIVE MASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 18658522 titled 'REFLECTIVE MASK
The abstract describes a reflective mask with multiple layers including a substrate, a reflective multilayer, a capping layer, an intermediate layer, an absorber layer, and a cover layer. The intermediate layer has a material with lower hydrogen diffusivity than the capping layer.
- The reflective mask includes a substrate, reflective multilayer, capping layer, intermediate layer, absorber layer, and cover layer.
- The intermediate layer has a material with lower hydrogen diffusivity than the capping layer.
- This design enhances the performance and durability of the reflective mask.
- The technology aims to improve the efficiency of reflective masks in various applications.
- The innovative layer structure provides better protection and functionality to the reflective mask.
Potential Applications: - Optical coatings - Solar panels - Reflective surfaces in electronic devices
Problems Solved: - Enhanced performance and durability of reflective masks - Improved protection against hydrogen diffusion
Benefits: - Increased efficiency in reflective mask applications - Enhanced durability and functionality - Improved protection against environmental factors
Commercial Applications: Title: Advanced Reflective Mask Technology for Optics and Electronics This technology can be utilized in optical devices, electronic displays, and solar panels, enhancing their performance and longevity in various industries.
Questions about Reflective Mask Technology: 1. How does the intermediate layer improve the performance of the reflective mask? The intermediate layer with lower hydrogen diffusivity than the capping layer enhances the durability and efficiency of the reflective mask. 2. What are the potential applications of this reflective mask technology? This technology can be applied in optical coatings, solar panels, and electronic devices, improving their functionality and longevity.
Original Abstract Submitted
A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The intermediate layer includes a material having a lower hydrogen diffusivity than a material of the capping layer.
