18652060. MEASUREMENT METHOD AND MEASUREMENT SYSTEM simplified abstract (Tokyo Electron Limited)
Contents
MEASUREMENT METHOD AND MEASUREMENT SYSTEM
Organization Name
Inventor(s)
Hikaru Fujiwara of Miyagi (JP)
MEASUREMENT METHOD AND MEASUREMENT SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18652060 titled 'MEASUREMENT METHOD AND MEASUREMENT SYSTEM
Simplified Explanation: The patent application describes a method for measuring capacitance between a measuring instrument and an edge ring in a chamber, involving the use of a conductive film on the edge ring.
- The method involves placing the edge ring with a conductive film on a stage in the chamber.
- The measuring instrument, which includes a sensor electrode, is then moved to a region surrounded by the edge ring on the stage.
- By measuring the capacitance between the instrument and the edge ring with the conductive film, the method determines the measured value.
Key Features and Innovation:
- Measurement method for capacitance in a chamber.
- Use of a conductive film on the edge ring.
- Sensor electrode on the measuring instrument.
- Transporting the instrument to the region surrounded by the edge ring for measurement.
Potential Applications: This technology could be used in semiconductor manufacturing processes, specifically in chambers where precise capacitance measurements are required.
Problems Solved:
- Ensures accurate capacitance measurements in a controlled environment.
- Facilitates quality control in semiconductor manufacturing.
Benefits:
- Improved accuracy in capacitance measurements.
- Enhanced quality control processes.
- Increased efficiency in semiconductor manufacturing.
Commercial Applications: The technology could be valuable for semiconductor companies looking to optimize their manufacturing processes and ensure high-quality products.
Prior Art: Readers interested in prior art related to this technology could explore patents or research papers on capacitance measurement methods in semiconductor manufacturing.
Frequently Updated Research: Stay updated on the latest advancements in capacitance measurement techniques in semiconductor manufacturing for potential improvements in this technology.
Questions about Capacitance Measurement in Semiconductor Manufacturing: 1. How does the use of a conductive film on the edge ring improve capacitance measurements in the chamber? 2. What are the potential challenges in implementing this measurement method in semiconductor manufacturing processes?
Original Abstract Submitted
A measurement method according to an exemplary embodiment acquires a measured value indicating a capacitance between a measuring instrument and an edge ring in a chamber. The measuring instrument includes a base substrate and a sensor electrode provided on the base substrate. The method includes holding, on a stage in the chamber, the edge ring having a conductive film formed on a surface thereof. The method includes transporting the measuring instrument to a region on the stage which is surrounded by the edge ring. The method includes acquiring the measured value indicating the capacitance between the measuring instrument and the edge ring having the conductive film by using the measuring instrument transported to the inner side of the region.
