18629454. EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18629454 titled 'EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
Simplified Explanation: The patent application describes an exposure apparatus for a photosensitive body that includes light-emitting chips with multiple current sources and light-emitting elements grouped into different element groups.
- Each light-emitting chip has K current sources and light-emitting elements grouped into K light-emitting element groups.
- The light-emitting elements in each group receive electric current from a corresponding current source.
- The width of each light-emitting element group in the first direction is optimized based on human vision contrast sensitivity.
Key Features and Innovation:
- Light-emitting chips with multiple current sources and grouped light-emitting elements.
- Optimization of element group width based on human vision contrast sensitivity.
- Enhanced exposure accuracy and efficiency for photosensitive bodies.
Potential Applications:
- Semiconductor manufacturing
- Photolithography processes
- Printed circuit board production
Problems Solved:
- Improved exposure accuracy
- Enhanced contrast sensitivity
- Increased efficiency in photosensitive body exposure
Benefits:
- Higher quality output
- Increased productivity
- Cost savings in manufacturing processes
Commercial Applications: Exposure apparatus for semiconductor manufacturing processes with optimized light-emitting chips for enhanced exposure accuracy and efficiency.
Prior Art: Prior art related to exposure apparatus in semiconductor manufacturing processes and photolithography techniques.
Frequently Updated Research: Ongoing research on optimizing exposure apparatus for various manufacturing processes.
Questions about exposure apparatus technology: 1. How does the optimization of light-emitting element group width improve exposure accuracy? 2. What are the potential cost savings associated with using this exposure apparatus technology?
Original Abstract Submitted
There is provided an exposure apparatus for exposing a photosensitive body. The exposure apparatus includes light-emitting chips arranged along a first direction parallel to an axial direction of the photosensitive body. Each of the light-emitting chips includes: K current sources; and light-emitting elements arranged in the first direction and grouped into K light-emitting element groups. Light-emitting elements belonging to a k-th light-emitting element group are supplied with electric current from a k-th current source, where k=1, 2, . . . , K. For every one light-emitting element group out of the K light-emitting element groups, a width occupied in the first direction by the one light-emitting element group is larger than a lower limit value corresponding to a spatial frequency at which contrast sensitivity of human vision represented by a visual transfer function peaks.
