18624572. EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
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EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18624572 titled 'EXPOSURE APPARATUS AND IMAGE-FORMING APPARATUS
Simplified Explanation: The patent application describes an exposure apparatus that uses light-emitting elements to correct unevenness in light amount on a photosensitive member by adjusting the number of elements turned on.
- The exposure apparatus includes light-emitting elements arranged along a rotation axis and a processor for controlling them.
- The processor generates correction data to adjust the number of elements based on a correction amount for light amount unevenness.
- Image data is corrected according to the correction data, with a limit value for excessive correction amounts.
Key Features and Innovation:
- Control of light-emitting elements to correct uneven light distribution.
- Generation of correction data based on correction amounts.
- Limiting correction values for excessive adjustments.
Potential Applications: The technology can be used in semiconductor manufacturing, lithography processes, and other industries requiring precise exposure control.
Problems Solved: The technology addresses issues of uneven light distribution on photosensitive surfaces, ensuring accurate and consistent exposure.
Benefits:
- Improved image quality and accuracy in exposure processes.
- Enhanced control over light distribution for better results.
- Increased efficiency and productivity in manufacturing processes.
Commercial Applications: Title: Precision Exposure Control Technology for Semiconductor Manufacturing This technology can be applied in the semiconductor industry for advanced lithography processes, improving production quality and efficiency.
Prior Art: Researchers can explore prior patents related to exposure apparatuses, light control systems, and image correction technologies for further insights into this field.
Frequently Updated Research: Ongoing research in exposure apparatus technologies, light control algorithms, and image correction methods can provide valuable updates on advancements in this area.
Questions about Exposure Apparatus Technology: 1. How does the exposure apparatus improve image quality in semiconductor manufacturing processes? 2. What are the key factors influencing the correction data generated by the processor in the exposure apparatus?
Original Abstract Submitted
An exposure apparatus includes light-emitting elements arranged along a direction of a rotation axis of a photosensitive member and at least one processor. The at least one processor is configured to controls driving of the light-emitting elements, generate correction data for use in increasing or decreasing the number of the light-emitting elements to be turned on based on a correction amount for correcting unevenness in light amount, and correct image data in accordance with a value indicated by the correction data. For a pixel for which the correction amount indicates a value exceeding a predetermined limit value, the correction data indicates a value that is equal to or smaller than the limit value.
