18619870. IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE
Organization Name
Inventor(s)
NAOKI Murasato of Tochigi (JP)
IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18619870 titled 'IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE
Simplified Explanation: The imprint apparatus described in the patent application corrects the shape of a mold using a shape correction mechanism with multiple contact portions, a detection unit to monitor the contact states of these portions, and a control unit to stabilize the mold position during imprint processing.
- The imprint apparatus corrects the shape of a mold using multiple contact portions.
- A detection unit monitors the contact states of the contact portions.
- A control unit stabilizes the mold position by adjusting the drive timings of the contact portions.
Key Features and Innovation: - Shape correction mechanism with multiple contact portions - Detection unit to monitor contact states - Control unit for stabilizing mold position
Potential Applications: This technology can be used in semiconductor manufacturing, nanotechnology, and microfabrication processes.
Problems Solved: - Ensures accurate and precise molding of imprint material on substrates - Improves the quality and consistency of imprinted patterns
Benefits: - Enhanced precision in imprint processing - Increased efficiency in manufacturing processes - Improved quality control in mold shaping
Commercial Applications: The imprint apparatus can be utilized in the semiconductor industry for producing microchips, in nanotechnology for creating nanostructures, and in various other industries requiring precise molding processes.
Prior Art: Readers can explore prior art related to imprint processing, mold shaping, and semiconductor manufacturing technologies for further insights into the development of this innovation.
Frequently Updated Research: Stay updated on the latest advancements in imprint processing, mold correction mechanisms, and semiconductor manufacturing technologies to enhance the understanding and application of this technology.
Questions about imprint apparatus: 1. How does the imprint apparatus improve the accuracy of mold shaping? 2. What are the potential implications of this technology in the field of nanotechnology?
By providing a detailed and comprehensive overview of the imprint apparatus technology, readers can gain a deeper understanding of its applications, benefits, and implications in various industries.
Original Abstract Submitted
An imprint apparatus performing imprint processing for molding an imprint material on a substrate using a mold includes a shape correction mechanism configured to correct a shape of the mold using a plurality of contact portions for applying a force to side surfaces of the mold, a detection unit configured to detect contact states of the plurality of contact portions, and a control unit configured to perform a stabilizing operation of moving the mold toward a stable position by adjusting drive timings of the plurality of contact portions in accordance with an output of the detection unit.
