18612221. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
Organization Name
Inventor(s)
Kazuya Nabeta of Toyama-shi (JP)
Haruo Morikawa of Toyama-shi (JP)
Yoshihiko Yanagisawa of Toyama-shi (JP)
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18612221 titled 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
Simplified Explanation: The patent application describes a technique involving a process chamber where a substrate is processed using a gas supplied by a gas supplier. A microwave supplier supplies microwaves into the chamber, and a microwave stirrer stirs the microwaves by rotating due to the flow of gas in the chamber.
- Gas supplier provides gas into the process chamber
- Microwave supplier supplies microwaves into the chamber
- Microwave stirrer stirs the microwaves by rotating due to the gas flow
Potential Applications: 1. Semiconductor manufacturing 2. Thin film deposition 3. Surface treatment processes
Problems Solved: 1. Uniform distribution of gas and microwaves in the process chamber 2. Enhanced processing efficiency 3. Improved substrate quality
Benefits: 1. Increased process uniformity 2. Higher processing speeds 3. Better control over processing parameters
Commercial Applications: Microwave-assisted processing technology can be utilized in industries such as semiconductor manufacturing, solar cell production, and advanced materials research. This innovation can lead to faster processing times, improved product quality, and increased efficiency in various manufacturing processes.
Questions about Microwave Stirrer Technology: 1. How does the rotation of the microwave stirrer contribute to the processing of the substrate? 2. What are the potential challenges associated with integrating microwave stirrers into existing process chambers?
Original Abstract Submitted
There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supplier configured to supply a gas into the process chamber; a microwave supplier configured to supply a microwave into the process chamber; and a microwave stirrer configured to stir the microwave by being rotated due to a flow of the gas in the process chamber.
