18611440. DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY - A simplified explanation of the abstract
This abstract first appeared for US patent application 18611440 titled 'DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
Simplified Explanation: A photolithography system uses tin droplets to create extreme ultraviolet radiation for photolithography by energizing the droplets with a laser, causing them to emit radiation towards a target.
- Tin droplets are irradiated with a laser to generate extreme ultraviolet radiation.
- A collector reflects the radiation towards a photolithography target.
- To reduce splashback, a net electric charge is created within the droplets using a charge electrode.
- Droplets are decelerated by applying an electric field with a counter electrode.
Key Features and Innovation: - Utilization of tin droplets for extreme ultraviolet radiation in photolithography. - Laser irradiation of droplets to energize and emit radiation. - Implementation of a collector to direct radiation towards a target. - Reduction of splashback through the generation of a net electric charge within droplets. - Deceleration of droplets using an electric field to prevent unwanted effects.
Potential Applications: This technology can be applied in semiconductor manufacturing, integrated circuit production, and other industries requiring high-precision lithography processes.
Problems Solved: - Minimization of splashback of tin droplets onto the receiver. - Enhancement of precision and efficiency in photolithography processes. - Improvement of overall quality and accuracy in semiconductor manufacturing.
Benefits: - Increased accuracy and precision in lithography processes. - Reduction of material waste and production costs. - Enhanced performance and quality of semiconductor devices.
Commercial Applications: The technology can be utilized in semiconductor fabrication facilities, research institutions, and companies specializing in advanced manufacturing processes to improve lithography techniques and enhance product quality.
Questions about Photolithography System with Tin Droplets:
1. What are the primary advantages of using tin droplets for extreme ultraviolet radiation in photolithography? 2. How does the generation of a net electric charge within the droplets help reduce splashback in the system?
Original Abstract Submitted
A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system reduces splashback of the tin droplets onto the receiver by generating a net electric charge within the droplets using a charge electrode and decelerating the droplets by applying an electric field with a counter electrode.
