18605996. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
Contents
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM
Organization Name
Inventor(s)
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18605996 titled 'PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM
Simplified Explanation: The patent application describes a plasma processing apparatus where electrical bias energy is provided to a substrate support from a bias power supply, while source radio-frequency power is provided to a radio-frequency electrode from a radio-frequency power supply. The radio-frequency power supply selects an initial frequency group for a specified process and uses multiple frequencies from this group in the waveform cycle of the electrical bias energy.
- The patent involves a plasma processing apparatus with separate power supplies for bias energy and radio-frequency power.
- The radio-frequency power supply selects an initial frequency group for a specific process.
- Multiple frequencies from the initial group are used in the waveform cycle of the electrical bias energy.
- The radio-frequency power supply adjusts the source frequencies in the waveform cycle during different periods.
Potential Applications: This technology can be applied in semiconductor manufacturing, thin film deposition, surface modification processes, and other plasma processing applications where precise control of electrical bias energy and radio-frequency power is required.
Problems Solved: This technology addresses the need for efficient and controlled plasma processing by providing a method to adjust source frequencies in the waveform cycle, enhancing process flexibility and performance.
Benefits: - Improved process control and flexibility - Enhanced performance in plasma processing applications - Increased efficiency and productivity in semiconductor manufacturing
Commercial Applications: Title: Advanced Plasma Processing Technology for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to enhance process control, improve product quality, and increase overall efficiency in manufacturing operations.
Prior Art: Prior research in plasma processing technologies, radio-frequency power supplies, and semiconductor manufacturing methods can provide valuable insights into the development and innovation of this technology.
Frequently Updated Research: Ongoing research in plasma processing, radio-frequency power supply technology, and semiconductor manufacturing advancements may influence the further development and optimization of this technology.
Questions about Plasma Processing Technology: 1. How does this technology improve the efficiency of plasma processing applications? 2. What are the key advantages of using multiple frequencies in the waveform cycle for adjusting source power in plasma processing?
Original Abstract Submitted
In a plasma processing apparatus, electrical bias energy is provided from a bias power supply to a substrate support. Source radio-frequency power is provided from a radio-frequency power supply to a radio-frequency electrode. The radio-frequency power supply selects, from a plurality of frequency groups, an initial frequency group corresponding to a specified process. The radio-frequency power supply uses, in a first period, a plurality of frequencies included in the initial frequency group as a plurality of source frequencies of the source radio-frequency power for a respective plurality of phase periods in a waveform cycle of the electrical bias energy. The radio-frequency power supply adjusts, in a second period, the plurality of source frequencies of the source radio-frequency power for the respective plurality of phase periods in a waveform cycle of the electrical bias energy.
